2020
DOI: 10.1016/j.mee.2020.111255
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Fabrication of robust PDMS micro-structure with hydrophobic and antifouling properties

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Cited by 26 publications
(39 citation statements)
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“…These patterns were arranged in a square array. Si master molds of both the PIL and C-RESS micro-structure were fabricated by a conventional photolithography and deep reactive ion etching (DRIE) process [ 34 , 36 ]. In this experiment, the resolution of the lithographic exposure tool called Nikon stepper, model NSR2005i8A (Miyagi Nikon Precision Co., Ltd., Miyaki, Japan) is 0.5 µm.…”
Section: Methodsmentioning
confidence: 99%
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“…These patterns were arranged in a square array. Si master molds of both the PIL and C-RESS micro-structure were fabricated by a conventional photolithography and deep reactive ion etching (DRIE) process [ 34 , 36 ]. In this experiment, the resolution of the lithographic exposure tool called Nikon stepper, model NSR2005i8A (Miyagi Nikon Precision Co., Ltd., Miyaki, Japan) is 0.5 µm.…”
Section: Methodsmentioning
confidence: 99%
“…This prevents getting mold damage from hard PDMS residues in a poor demolding process. The HMDS molecules form a self-assembled monolayer (SAM) onto the Si surface of which the non-polar methyl groups repel water droplets inducing a slight hydrophobicity onto the Si surface (WCA: 60°–80°) with correspondingly good PDMS mold release properties [ 34 , 36 ]. Subsequently, the PDMS mixture (Sylgard 184, curing agent: 10 wt%, Sigma-Aldrich, St. Louis, MO, USA) was poured onto the Si master molds containing either the PIL or C-RESS pattern [ 34 , 36 ].…”
Section: Methodsmentioning
confidence: 99%
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