Fabrication of in-plane aligned YBCO films on polycrystalline Ni tapes buffered with surface-oxidized NiO layers

Matsumoto, Kaname; Kim, Seokbeom; Wen, Jianguo; Hirabayashi, I.; Watanabe, T.; Uno, Naoki; Ikeda, M.

doi:10.1109/77.784687

Cited by 92 publications

(22 citation statements)

References 6 publications

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“…Therefore, attempting to deposit an NiO film having a cube texture on an Ni substrate seems paradoxical since the oxidation of an Ni substrate during the deposition of NiO film induces the development of (111) oriented NiO film, which should be avoided in order to obtain an NiO film having a cube texture. However, Matsumoto et aL obtained a cube textured NiO by oxidizing a cube textured Ni substrate in flowing oxygen [8] or an Ar atmosphere [4]. Therefore, it is still unclear whether the oxidation of an Ni substrate always leads to the development of a (111) orientation of a buffer film.…”

Section: Thermodynamical Background For the Deposition Of Nio Film Onmentioning

confidence: 98%

Epitaxial deposition of NiO film on a cube-textured Ni substrate by metal-organic chemical vapor deposition

Lee

Shin

et al. 2000

Metals and Materials

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NiO films have been epitaxially grown by metal-organic chemical vapor deposition (MOCVD) on a bi-axially textured Ni substrate using Ni(thd): as a precursor. The NiO film was deposited at 470~ for 10 min at a deposition pressure of 10 Torr and oxygen partial pressure of 0.91Torr. SEM and AFM observations for the deposited NiO film showed a smooth and dense morphology. X-ray rocking curve and tlJ-scan showed that the NiO film has a bi-axial texture with a (100)<031> orientation. The out-of-plane and the in-plane deviations were measured to be 4.2 ~ and 6~7 ~ from the FWHM of (200) and (111) planes, respectively.

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Section: Thermodynamical Background For the Deposition Of Nio Film Onmentioning

confidence: 98%

Epitaxial deposition of NiO film on a cube-textured Ni substrate by metal-organic chemical vapor deposition

Lee

Shin

et al. 2000

Metals and Materials

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“…The most important result of these studies was the development of the surface-oxidation epitaxy technique (SOE), which allowed growing the NiO layer epitaxially on the Ni-W surface with good (001) orientation. [8][9][10][11] This epitaxial NiO film can be used successfully as a template for epitaxy of the subsequent buffer layers without further oxidation of the Ni-W tape. However, SOE-grown NiO exhibits a rough surface, which is obviously a great disadvantage of this approach because it substantially decreases the critical current density that can be achieved on such substrates.…”

Section: Introductionmentioning

confidence: 98%

Revealing the mechanism of the early stages of Ni–W RABiTS oxidation

et al. 2010

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The early stages of surface oxidation of biaxially textured Ni-W tapes were studied using thermodynamic calculations along with experimental tape oxidation at low P(O 2 ). Tape phase and chemical composition, surface morphology, and roughness were examined using x-ray diffraction (XRD), energy-dispersive x-ray analysis (EDX), secondary ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). For a Ni 0.95 W 0.05 alloy tape, the precise position of the tape oxidation line in P(O 2 )-T coordinates was established. This line includes a break at T % 650 C that originates from the change of the W oxidation mechanism from internal oxidation to oxidation on a free surface accompanied by segregation of the alloy components in the tape near-surface region. The surface roughness of a polished tape increased drastically during internal oxidation of W; further tape oxidation did not affect the integral roughness parameters, but introduced numerous small ($100 nm) features on the tape surface comprising NiO precipitates.

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“…One approach is to form biaxially oriented buffer layers on nontextured Ni-based superalloys, such as IBAD (ion-beam-assisted deposition) [1], ISD (inclined substrate deposition) [2] and MBS (modified-bias sputtering) [3]. Another approach is to make biaxially oriented buffer layers on biaxially textured Ni tapes, such as RABiTS (rolling-assisted biaxially textured substrates) [4] and SOE (surface-oxidation epitaxy) [5]. In both cases, transport Jc were very high, however, these methods may have limitation for scale-up and higher costs in commercial production, because of their slow deposition rate of biaxially oriented oxide buffer layers and of complexity of structure of these wires.…”

Section: Introductionmentioning

confidence: 99%

Long length {110} {110} textured Ag tapes for biaxially oriented YBa/sub 2/Cu/sub 3/O/sub 7/coated conductors

Doi¹,

Mori

Hakuraku

et al. 2003

IEEE Trans. Appl. Supercond.

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A good 110 110 texture was successfully obtained by the only 3 minutes post-roll annealing by the careful control of the cold-roll process. Such a short annealing time will enable to skip the final annealing process of the Ag tape for the recrystallization and to save the cost of the furnace, energy and the time. We could obtain 20 m long cold-rolled Ag tape with enough uniformity, which can be converted to the 110 110 textured Ag tape by the only short time annealing. The 3 cm samples, cut from both end and from the middle part of the 20 m long cold-rolled tape and then annealed at 800 C for 5 minutes, were confirmed to have smooth surfaces and the shallow grooves at grain boundaries, as well as good 110 110 textures from the X-ray 100 pole figures and the SEM photographs.

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Fabrication of in-plane aligned YBCO films on polycrystalline Ni tapes buffered with surface-oxidized NiO layers

Cited by 92 publications

References 6 publications

Epitaxial deposition of NiO film on a cube-textured Ni substrate by metal-organic chemical vapor deposition

Epitaxial deposition of NiO film on a cube-textured Ni substrate by metal-organic chemical vapor deposition

Revealing the mechanism of the early stages of Ni–W RABiTS oxidation

Long length {110} {110} textured Ag tapes for biaxially oriented YBa/sub 2/Cu/sub 3/O/sub 7/coated conductors

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