Fabrication of diamond-like carbon films using short-pulse HiPIMS

Konishi, Takumi; Yukimura, Ken; Takaki, Koichi

doi:10.1016/j.surfcoat.2015.12.010

Cited by 57 publications

(19 citation statements)

References 34 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Besides nitrides, the hard diamond-like carbon films (DLCs) have also been deposited by HiPIMS. Konishi et al [92] deposited DLC films by sputtering a graphite target using a short pulse-operated HiPIMS. The hardness of the prepared DLC films was 37 GPa when the pulse width was 7 μs and the applied voltage was −1200 V. It was said that the highly ionized carbon species in HiPIMS was responsible for the high hardness of the DLC because of a high content of sp 3 fraction in the films.…”

Section: Hard Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

View full text Add to dashboard Cite

High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

show abstract

Section: Hard Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…Figure 7 shows how we try to recycle and increase service lifespan of ports to overcome corrosion problems [8,9]. The solution for this was a diamond-like coating obtained by E-gun deposition [10][11][12][13][14].…”

Section: Resultsmentioning

confidence: 99%

Recycling and Refurbishing of Epoxy Packaging Mold Ports and Plungers

2016

View full text Add to dashboard Cite

During the integrated circuit (IC) packaging process, acid or alkaline chemical ingredients in the packaging material and in the mold cleaning cake are the major contributor to the corrosion of mold ports and plungers. To prolong the service life of these parts, this study concentrates of three aspects of the problem: First, after recycling and cleaning the plungers and ports, a special vacuum coating is applied to counteract corrosion and reduce abrasion. This coating is resistant to acid and alkali and has a hardness of up to HV4000. This makes it both resistant to abrasion and prolongs working life. Halogen-free packaging material has now been introduced to produce Green Electric Membership Corporations (EMC). However, this material is more viscous than the older, more polluting, plastic cake and this shortens the time between mold cleaning and subsequently reduces time for production as well. Also, most abrasion of the plunger occurs within 3 mm of the tip. We have developed a silver welding technique for this portion and a process in which several materials are used for the main body of the plunger. The procedure involves cutting off the tip and welding on a compound material, we have used DC53 + F10 Steel. These techniques allow recycling and refurbishment of the plungers and ports of packaging molds to prolong their service life to a considerable degree. Take Advanced Semiconductor Engineering Inc. as an example, if each plant uses 1000 sets a month, 12 plants will use 144 thousand sets every year. The saving on each set is about NT$1600. This represents a saving of half the expenditure on mold ports and plungers.

show abstract

“…The domain size of different phases could vary from several nanometers to a micrometer [10,22,23]. The reported hardness value of HiPIMS-deposited a-C:H could be higher than 30 GPa, and the hardness value of HiPIMS-deposited Cr could be lower than 7 GPa [12,[18][19][20]31]. Such great difference between different phases might be the reason of the high measurement error.…”

Section: Influences Of the Synchronized Substrate Bias And Depositionmentioning

confidence: 99%

“…The combination of chromium and carbon can synthesize various compounds, including metallic alloy, chromium carbides of different stoichiometric compositions, and carbon-based materials, which show different hardness, toughness, chemical stability, electrical conductivity, and tribological properties [1][2][3][4][5][6][7][8]. Metal-carbon thin films are easily synthesized via plasma-enhanced physical vapor depositions, such as cathodic arc ion plating [5,6,9], magnetron sputtering [10][11][12][13][14][15], electron-beam deposition [16,17], high-power impulse magnetron sputtering [12,[18][19][20], and a hybrid method [21]. The hardness of chromium carbide is varied up to ten times depending on the deposition processes [13][14][15].…”

Section: Introductionmentioning

confidence: 99%

“…The fractions of sp3/sp2 bonding ratio and nanocrystalline carbide phases influence the hardness, elastic modulus, and thermal stability of coatings [15,24]. The ratio of a-C:H and carbide phases is usually dominated by the mixture ratio of hydrocarbon and inert gas during the deposition [5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21][22], and the sp3/sp2 bonding ratio of a-C:H phases and grain size of carbides are strongly affected by the substrate bias voltage and the pulse width [6,14,18,19].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Kuo

Lin

Chang³

et al. 2020

Coatings

View full text Add to dashboard Cite

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

show abstract

Fabrication of diamond-like carbon films using short-pulse HiPIMS

Cited by 57 publications

References 34 publications

High power impulse magnetron sputtering and its applications

High power impulse magnetron sputtering and its applications

Recycling and Refurbishing of Epoxy Packaging Mold Ports and Plungers

Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Contact Info

Product

Resources

About