Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Kuo, Chin-Chiuan; Lin, Chun-Hui; Chang, Jing-Tang; Lin, Yu-Tse

doi:10.3390/coatings10121269

Cited by 3 publications

(9 citation statements)

References 36 publications

(83 reference statements)

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“…After argon glow discharge plasma cleaning, the pressure was further reduced to 0.8 Pa. The HiPIMS plasma was initiated on the Cr target and the −1000 V substrate bias voltage was switched to the unipolar pulsed mode and synchronized with the target HiPIMS pulses to proceed the Cr ion bombardment for 40 s. The reasons to apply the synchronized substrate bias can be seen in the other research [32,38] and our previous works [31,36,37]. Due to the recycling of ions and the flight delay of ions [33,38,39], the pulse width of the substrate bias voltage was set to 1.75-fold of HiPIMS pulses to optimally accelerate the Cr ion flux.…”

Section: Methodsmentioning

confidence: 99%

“…The hardness and the modulus of elasticity of Cr-C films were evaluated by applying the nanoindentation (TTX-NH3, Anton Paar, Graz, Austria). Settings of the analysis instruments were as the same as described in the previous works [31,36,37]. Notes: high-power impulse magnetron sputtering (HiPIMS).…”

Section: Methodsmentioning

confidence: 99%

“…It was found that the main structure of all the obtained films in the previous work is hydrogenated amorphous carbon. Although applying synchronized substrate bias successfully prevented the substrate voltage drop and inhibited arc discharge on deposited film [31,36,37]. A part of films presents loosen structures which seemed contrary to above-mentioned features of denser films via HiPIMS.…”

Section: Introductionmentioning

confidence: 92%

“…Films with higher density and Coatings 2021, 11, 873 2 of 10 better functions can be therefore achieved with the cost of lower deposition rate. Cr-C films deposited at different synchronized substrate bias voltage and argon/ethyne gas flow ratio from 1:1 to 12:1 were compared in the previous work [31]. It was found that the main structure of all the obtained films in the previous work is hydrogenated amorphous carbon.…”

Section: Introductionmentioning

confidence: 97%

“…In our previous work, the experiment on depositing chromium-carbon films by utilizing reactive high-power impulse magnetron sputtering (HiPIMS) was carried out [31]. HiPIMS provides high degree ionization of the sputtered species.…”

Section: Introductionmentioning

confidence: 99%

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Effects of the Ethyne Flow Ratio on Structures and Mechanical Properties of Reactive High Power Impulse Magnetron Sputtering Deposited Chromium-Carbon Films

Kuo

Chang

2021

Coatings

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Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering with different mixture ratios of ethyne and argon with a constant deposition total pressure while the deposition temperature, pulse frequency, duty cycle and average power of the chromium cathode remain the same. The microstructure and chemical bonding of the obtained films within different composition were compared. The results show that with the increasing ethyne ratio, the carbon content in films increases linearly with two slopes. Moreover, the microstructure of the deposited film changes from a dense glassy structure into a columnar structure, even a clusters structure. The sp2-C bonding in films decreases but the Cr–C bonding increases with decreasing the ethyne ratio. This reveals the main phase of films changes from a hydrogenated amorphous carbon phase into a glassy amorphous chromium carbide phase. Such changes of the microstructure and phase cause a large difference on the film hardness and elasticity.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 92%

Section: Introductionmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Effects of the Ethyne Flow Ratio on Structures and Mechanical Properties of Reactive High Power Impulse Magnetron Sputtering Deposited Chromium-Carbon Films

Kuo

Chang

2021

Coatings

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Fabrication and Characterization of Ti/TiC Composite Layers by an Electron-Beam Surface Modification

Valkov,

Nedeva,

Dunchev

et al. 2023

Coatings

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In this study, the possibilities for modification and improvement of the surface structure and properties of titanium substrates by a formation of composite Ti/TiC layers are presented. The layers were fabricated by a two-step electron-beam surface modification technique. The first step consists of injection of C powder within the pure Ti substrates by electron-beam alloying technology. The second step is the refinement and homogenization of the microstructure by the electron-beam remelting procedure. During the remelting, the speed of the motion of the samples was varied, and two (most representative) velocities were chosen: 5 and 15 mm/s. Considering both speeds of the motion of the specimens, a composite structure in the form of fine TiC particles distributed within the base titanium matrix was formed. The remelting speed of 5 mm/s led to the formation of a much thicker composite layer, where the TiC particles were significantly more homogeneously distributed. The results obtained for the Vickers microhardness exhibit a significant increase in the value in the mentioned mechanical characteristic in comparison with the base Ti substrate. In the case of the lower speed of the motion of the specimen during the remelting procedure, the microhardness is 510 HV, or about 2.5 times higher than that of the titanium substrate. The application of a higher speed of the specimen motion leads to a decrease in the microhardness in comparison with the case of lower velocity. However, it is still much higher than that of the base Ti material. The mean microhardness of the sample obtained by the remelting speed of motion of 15 mm/s is 360 HV, or it is 1.8 times higher than that of the base material.

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Wear Behaviors of Carbon–Chromium Carbide–Chromium Multilayer Coatings Prepared by Reactive High-Power Impulse Magnetron Sputtering

Kuo

2021

Materials

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Carbon–chromium carbide–chromium multilayer coatings were deposited by utilizing reactive high-power impulse magnetron sputtering with alternating various ratios of ethyne and argon mixtures under a constant total deposition pressure, target pulse frequency, pulse duty cycle, average chromium target power, and total deposition time. Two different alternating gas mixture periods were applied to obtain films with different numbers of layers and lamination thicknesses. The results show that the reduction in the modulation period effectively affects the elastic modulus and the subsequent ratio of hardness to elastic modulus (H/E) of the whole coating, which helps adapt the elastic strain in the coating. This improves the adhesion strength and wear resistance of coatings at room temperature. However, with the increase in wear test temperature, the difference between the wear behaviors of two types of coatings becomes inconspicuous. Both types of coatings lose the wear resistance due to the decomposition of hydrocarbon and the oxidation of the chromium content in the films.

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Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Cited by 3 publications

References 36 publications

Effects of the Ethyne Flow Ratio on Structures and Mechanical Properties of Reactive High Power Impulse Magnetron Sputtering Deposited Chromium-Carbon Films

Effects of the Ethyne Flow Ratio on Structures and Mechanical Properties of Reactive High Power Impulse Magnetron Sputtering Deposited Chromium-Carbon Films

Fabrication and Characterization of Ti/TiC Composite Layers by an Electron-Beam Surface Modification

Wear Behaviors of Carbon–Chromium Carbide–Chromium Multilayer Coatings Prepared by Reactive High-Power Impulse Magnetron Sputtering

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