2000
DOI: 10.1016/s0038-1101(00)00053-8
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Fabrication and electrical characterization of 4H-SiC p+–n–n+ diodes with low differential resistance

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Cited by 25 publications
(22 citation statements)
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“…To assess the validity of the parameters, the trap densities calculated from eq. (2) were applied to simulation of diodes reported in [11][12][13][14] and the results of breakdown voltages are compared to reported ones as shown in Table 1.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…To assess the validity of the parameters, the trap densities calculated from eq. (2) were applied to simulation of diodes reported in [11][12][13][14] and the results of breakdown voltages are compared to reported ones as shown in Table 1.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…Moreover, the thicker the drift layer is, the longer time it must have been exposed to high temperature in HTCVD for when fabricating the original wafer, which lead to larger defects density. To verify the above formula, the trap densities calculated by above formula were applied to diodes reported in [14][15][16][17][18] in simulation and the results of breakdown voltages are compared to reported ones shown in Table II.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…The feasibility of using GaN for IMPATT devices has been seen recently [1,2] in the literature. Some theoretical as well as experimental results on SiC-based IMPATTs are also seen recently in the literature [6,7]. A comparative study between GaN and 4H-SiC [8] shows that SiC are also the potential material to use for IMPATT devices at high frequency.…”
Section: Introductionmentioning
confidence: 82%