Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

Śmietana, Mateusz; Bock, Wojtek J.; Szmidt, J.

doi:10.1016/j.tsf.2011.04.032

Cited by 42 publications

(34 citation statements)

References 39 publications

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“…It should be noted that at the initial stage of DLC film growth, significant densification of the structure and variation of hydrogen content takes place, resulting in increase of the refractive index of the film with deposition time. Thus, varying the time of the thin‐film deposition process it is possible to change optical properties of DLC by modifying their structure . On the other hand, the DLC properties are very sensitive to the gas composition and other technological conditions during deposition .…”

Section: Resultsmentioning

confidence: 99%

Modeling of the plasmonic properties of DLC‐Ag nanocomposite films

Yaremchuk

Tamulevičienė

Tamulevičius

et al. 2013

Physica Status Solidi (a)

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In this work we present results of theoretical and experimental investigation of the optical absorption spectra of thin films of nanocomposite materials composed of silver nanoparticles embedded in a diamond‐like carbon (DLC) matrix. The optical characteristics of DLC‐Ag nanocomposite are considered within the framework of the effective medium approximation. The evolution of plasmon resonance characteristics and optical properties due to changes of dielectric constant of DLC host and size of the embedded metal nanoparticles is studied. The experimental absorption spectra of DLC‐based silver nanocomposites deposited by reactive magnetron sputtering on fused‐silica were compared with the simulated ones. The observed redshift and broadening of the surface plasmon resonance (SPR) bands were explained using Mie scattering theory and Maxwell–Garnett effective medium theory. The obtained results suggest that a random mixture consisting of the DLC film with embedded isolated silver inclusions is a promising material for the fabrication of tunable nanocomposites in different sensing platforms.

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Section: Resultsmentioning

confidence: 99%

Modeling of the plasmonic properties of DLC‐Ag nanocomposite films

Yaremchuk

Tamulevičienė

Tamulevičius

et al. 2013

Physica Status Solidi (a)

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“…In this respect, Tables II and III present details of very recent vapor phase deposition techniques of SiN x thin films, along with a synopsis of intended applications. 15,16,[20][21][22][23][24][25][31][32][33][34][36][37][38] More specifically, Table II summarizes PVD and CVD work, while Table III focuses exclusively on atomic layer deposition ALD.…”

mentioning

confidence: 99%

Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: Trends in Deposition Techniques and Related Applications

Kaloyeros

Jové

Goff

et al. 2017

ECS J. Solid State Sci. Technol.

127

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This article provides an overview of the state-of-the-art chemistry and processing technologies for silicon nitride and silicon nitride-rich films, i.e., silicon nitride with C inclusion, both in hydrogenated (SiNx:H and SiNx:H(C)) and non-hydrogenated (SiNx and SiNx(C)) forms. The emphasis is on emerging trends and innovations in these SiNx material system technologies, with focus on Si and N source chemistries and thin film growth processes, including their primary effects on resulting film properties. It also illustrates that SiNx and its SiNx(C) derivative are the focus of an ever-growing research and manufacturing interest and that their potential usages are expanding into new technological areas.

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“…Silicon nitride (SiN x ) oers high n comparing to the one of ber cladding. The lms can be deposited with radio frequency plasma enhanced chemical vapor deposition (RF PECVD) method capable for easy and precise tuning of n and thickness of the lms [6]. These properties are crucial for obtaining high sensitivity of the berbased device.…”

Section: Introductionmentioning

confidence: 99%

Silicon Nitride Overlays Deposited on Optical Fibers with RF PECVD Method for Sensing Applications: Overlay Uniformity Aspects

2015

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This work discusses uniformity of overlays deposited with radio frequency plasma enhanced chemical vapor deposition method on a core of partly uncoated multimode polymer-clad silica optical ber. Although the method provides uniform lms on at surfaces, uniformity of deposition on optical bers suspended in plasma is questionable. In this work we investigate optical-ber-based structures coated with high-refractive-index (nD > 2.3) silicon nitride (SiNx) where lossy mode resonance phenomenon appears. Experimental studies, where the ber is rotated by 90• and 180• , are compared to those where the sample has not been rotated between the depositions. Deposition process time for all samples has been adjusted in order to obtain the same thickness of overlays on all the bers. The experimental data has been supported by numerical simulations. The experiment has shown that the rotation modies transmission of the SiNx-coated ber structure, as well as its response to external refractive index. As an eect of rotation we observed shift of the resonance appearing at about λ = 600 nm towards shorter wavelengths and reduction in amount of the resonances. However, the resonances appearing in transmission spectrum for sample with no rotation show the highest refractive index sensitivity reaching about 690 nm per refractive index unit.

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Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

Cited by 42 publications

References 39 publications

Modeling of the plasmonic properties of DLC‐Ag nanocomposite films

Modeling of the plasmonic properties of DLC‐Ag nanocomposite films

Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: Trends in Deposition Techniques and Related Applications

Silicon Nitride Overlays Deposited on Optical Fibers with RF PECVD Method for Sensing Applications: Overlay Uniformity Aspects

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