2006
DOI: 10.1109/jsen.2006.884424
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Enhancement of Temperature Sensitivity for Metal–Oxide–Semiconductor (MOS) Tunneling Temperature Sensors by Utilizing Hafnium Oxide <formula formulatype="inline"><tex>$(\hbox{HfO}_{2})$</tex></formula> Film Added on Silicon Dioxide <formula formulatype="inline"><tex>$(\hbox{SiO}_{2})$</tex></formula>

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Cited by 12 publications
(3 citation statements)
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“…3) In order to solve the problem, complementary metal-oxidesemiconductor (CMOS) compatible sensors that used metaloxide-semiconductor (MOS) tunneling diode were introduced. [3][4][5] In the MOS tunneling diode type temperature sensors, saturation current of sensor was used for temperature detection. The saturation current is determined by minority carrier generation rate and direct tunneling.…”
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confidence: 99%
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“…3) In order to solve the problem, complementary metal-oxidesemiconductor (CMOS) compatible sensors that used metaloxide-semiconductor (MOS) tunneling diode were introduced. [3][4][5] In the MOS tunneling diode type temperature sensors, saturation current of sensor was used for temperature detection. The saturation current is determined by minority carrier generation rate and direct tunneling.…”
mentioning
confidence: 99%
“…6) Instead of extremely thin SiO 2 , HfO 2 layer was adopted to insulator layer of MOS tunneling diode type temperature sensor. 4) In this work, we introduce a different type of metalinsulator-semiconductor (MIS) tunneling diode type temperature sensor with Bi 2 Mg 2=3 Nb 4=3 O 7 (BMNO) layer. In the previous works, BMNO layers had high dielectric constants and were proven to be acceptable for various applications.…”
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