Enhanced Electrical Stability of LP-MOCVD-Deposited ZnO:B Layers by Means of Plasma Etching Treatment

Abstract

Electrical properties of transparent conductive ZnO:B films, obtained by the low-pressure metal organic chemical vapor deposition (LP-MOCVD) technique, were monitored during the given time, and a heavy worsening of these properties was observed. At the same time, other ZnO:B samples subjected to a post-deposition treatment by argon plasma etching showed an appreciable enhancement of the electrical stability in the given time. A degradation mechanism, involving formation of O– adsorbate and its diffusion inside the grain boundary, is proposed as responsible of the carrier mobility worsening. Furthermore, the beneficial effect of the plasma treatment is explained in terms of a rearrangement of the grain boundary with a decrease of positively charged defect density and, consequently, a slowing down of O– formation rate. Finally, argon plasma post-deposition treatment is proposed as an effective process for obtaining ZnO:B films with an appreciable electrical stability in the given time.

Ar/O2 and H2O plasma surface modification of SnO2 nanomaterials to increase surface oxidation

“…[34][35][36] Notably, several specific pathways are available for surface activation, most notably heavy ion impact (Ar species), and chemical etching (oxygen species).…”

Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO

“…It is also highly toxic 89 and is consequently typically used as a 1-10% solution in H 2 . B 2 H 6 has been the most widely used as a CVD precursor to ZnO:B [90][91][92][93][94][95][96][97][98] with, to date, relatively few reports of its use in ALD. [85][86][87][88] We believe that the reason behind this low number of publications on the use of B 2 H 6 for ALD is its extremely high vapour pressure, 99 which is not easy to control under ALD conditions.…”

Approximate analysis of optical properties for ZnO rough surfaces

“…Aforementioned samples were fabricated according to [3]. They were both optically and electrically characterized, in particular optical properties were defined in terms of transmittance profile.…”

“…In Section II the MATLAB code which evaluates statistical parameters and looks for the minimal surface is described. In Section III the procedure is applied to experimental samples made by CVD deposited ZnO thin film [3,4]. Conclusions are drawn in Section IV.…”