Crystalline gallium oxide is a promising wide‐bandgap semiconductor material, especially for applications in high‐frequency and high‐power devices. With an optical bandgap energy well above 4 eV, which implies no visible light absorption, it is also a candidate for one of the front‐side layers in thin‐film solar cells. X‐ray amorphous gallium oxide (a‐Ga2O3) deposited by RF magnetron sputtering is applied as an n‐type buffer layer in substrate‐type configuration solar cells based on industry‐relevant inline coevaporated Cu(In,Ga)Se2 (CIGS) absorbers, which include an i‐ZnO/ZnO:Al bilayer as the front electrode. The cells exhibit an efficiency peak at Ga2O3 deposition temperatures in the range of 140–180 °C and show mostly a gain in short‐circuit current density compared with the CdS‐buffered reference cells, as a result of the high optical bandgap of a‐Ga2O3 in the range of 4.6–4.8 eV. The CIGS solar cells with sputtered a‐Ga2O3 buffers reach efficiencies of almost 14%, lacking in open‐circuit voltage and fill factor, whereas the CdS‐buffered cells are on a 16–17% level. Light soaking of the cells leads to a slight improvement of the fill factor, but the gap in open‐circuit voltage of 80–100 mV in contrast to the CdS‐buffered reference cells remains unaffected.