2021
DOI: 10.1002/pssr.202100180
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The Application of Sputtered Gallium Oxide as Buffer for Cu(In,Ga)Se2 Solar Cells

Abstract: Crystalline gallium oxide is a promising wide‐bandgap semiconductor material, especially for applications in high‐frequency and high‐power devices. With an optical bandgap energy well above 4 eV, which implies no visible light absorption, it is also a candidate for one of the front‐side layers in thin‐film solar cells. X‐ray amorphous gallium oxide (a‐Ga2O3) deposited by RF magnetron sputtering is applied as an n‐type buffer layer in substrate‐type configuration solar cells based on industry‐relevant inline co… Show more

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Cited by 7 publications
(8 citation statements)
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References 43 publications
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“…Subsequently, Ga 2 O 3 was deposited by radiofrequency (RF) magnetron sputtering from a ceramic target at a substrate temperature of 150 °C (details of the Ga 2 O 3 sputter-deposition process can be found in refs and ), generating films with thickness d of 1, 3, 10, and 100 nm. The thicknesses were estimated from sputter-deposition rates determined by optical transmittance measurements on thick Ga 2 O 3 layers ( d > 200 nm) deposited on 1 mm highly transparent quartz-glass substrates.…”
Section: Methodsmentioning
confidence: 99%
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“…Subsequently, Ga 2 O 3 was deposited by radiofrequency (RF) magnetron sputtering from a ceramic target at a substrate temperature of 150 °C (details of the Ga 2 O 3 sputter-deposition process can be found in refs and ), generating films with thickness d of 1, 3, 10, and 100 nm. The thicknesses were estimated from sputter-deposition rates determined by optical transmittance measurements on thick Ga 2 O 3 layers ( d > 200 nm) deposited on 1 mm highly transparent quartz-glass substrates.…”
Section: Methodsmentioning
confidence: 99%
“…Avoiding the use of CBD-CdS is motivated by reducing the environmental impact of the production process, 19,20 reducing the parasitic absorption, 21−23 and developing a "dry" process that does not interrupt a vacuum-based process chain. 20,24 Thus, alternative buffer layer materials, including In x S y , 24−28 Zn(O,S,OH), 3,28,29 (Zn,Mg)O, 30−32 Zn 1−x Sn x O y , 33,34 HfO x , 35 Al 2 O 3 , 28,36,37 Ga 2 O 3 , 23,24,38 Sn 1−x Ga x O y , 22 (In,Ga) 2 O 3 , 23 and (Al,Ga) 2 O 3 , 23 have been investigated. A particularly promising candidate among the alternative buffer layers is the wide band gap transparent oxide Ga 2 O 3 , with an optical bulk band gap between 4.4 and 4.9 eV.…”
Section: ■ Introductionmentioning
confidence: 99%
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