1998
DOI: 10.1063/1.121636
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Effects of thermal annealing on the indium tin oxide Schottky contacts of n-GaN

Abstract: In this work indium tin oxide (ITO) films were prepared using electron beam evaporation to form Schottky contacts on n-type GaN films. The thermal stability of ITO on n-type GaN was also investigated by annealing the samples at various temperatures. In addition, current–voltage (I–V) measurements were taken to deduce the Schottky barrier heights. Owing to the large series resistance, the Norde method was used to plot the F(V)–V curves and the effective Schottky barrier heights were determined as well. The effe… Show more

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Cited by 152 publications
(82 citation statements)
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“…Note that the as-deposited ITO contact produces slightly rectifying behavior, indicating that the ITO Ohmic contact to n-GaN cannot be easily obtained in spite of high N values of nlayer. Indeed, this result is somewhat different as compared with that of Sheu et al, [12] reported that the asdeposited ITO produced Ohmic contact to n-GaN. The observed different behavior might be attributed to the different ITO deposition condition, i.e., the growth temperature of ITO was as high as 500 ºC, in which high growth temperature is expected to influence the ITO crystallinity, as will be discussed later in details.…”
Section: Introductioncontrasting
confidence: 54%
See 1 more Smart Citation
“…Note that the as-deposited ITO contact produces slightly rectifying behavior, indicating that the ITO Ohmic contact to n-GaN cannot be easily obtained in spite of high N values of nlayer. Indeed, this result is somewhat different as compared with that of Sheu et al, [12] reported that the asdeposited ITO produced Ohmic contact to n-GaN. The observed different behavior might be attributed to the different ITO deposition condition, i.e., the growth temperature of ITO was as high as 500 ºC, in which high growth temperature is expected to influence the ITO crystallinity, as will be discussed later in details.…”
Section: Introductioncontrasting
confidence: 54%
“…[12,13] This might be due to the lack of possible application of ITO/n-GaN contact system. However, it is worth noting that, if the ITO produces Ohmic contact to n-GaN, ITO can be used as the n-type transparent conductive electrodes of GaN-based LEDs, in which may lead to a enhancement of light extraction efficiency.…”
Section: Introductionmentioning
confidence: 99%
“…Work on TCO contacts to GaAs, InP and GaN focused on sputter deposited indium tin oxide (ITO) films. ITO as a contact to both p-type and n-type GaN exhibits non-linear behaviour [6]. However, ITO-contacted GaN-based LEDs showed uniform luminescence, indicating effective current-spreading and hole injection [7].…”
mentioning
confidence: 99%
“…The n-type semiconductors such as indium tin oxide (ITO) (2), indium zinc oxide (3,4), aluminium doped zinc oxide (AZO) and fluorine or antimony doped tin oxide (FTO, ATO) (5) are widely used as transparent conducting substrates. ITO and SnO 2 can be prepared on a glass substrate by chemical vapor deposition (6), sputtering (7), spray pyrolysis (8), electron beam evaporation (9), and oxygen ion beam assisted deposition (10). General requirements for transparent conducting film are low electrical resistivity and high transparency in visible spectral region.…”
Section: Introductionmentioning
confidence: 99%