Transparent conducting ZnO contacts to GaN, of light transmittance >70% in the visible spectrum have been prepared by thermal oxidation of vacuum deposited zinc. For low-doped p-GaN the contact exhibits ohmic behaviour (1 Â 10 -2 W cm 2 ); on low-doped n-GaN a Schottky barrier (0.56 eV) is observed. We find the properties of ZnO contact promising for optoelectronic device applications.Introduction There is a consensus in the nitride community, that the lack of reliable p-type doping and p-type contacting procedures is hampering the development of GaNbased optoelectronics. Usually, bilayer Ni/Au [1] or Pt-based metallizations [2,3] are used to fabricate ohmic contacts for LEDs and laser diodes. To achieve optical transparency, metallization of a thickness reduced to 5-10 nm is applied, but at the expense of increased contact resistivity and reduced long-term stability. The growing interest is observed in the use of transparent conducting metal oxides (TCOs) for III-V semiconductors contacting purposes [4]. TCOs electro-optical properties are unique in nature in providing high optical transmittance in the visible range of wavelength as well as excellent electrical conductivity. TCO-based hole-injecting anodes are implemented in the majority of organic LEDs [5]. Work on TCO contacts to GaAs, InP and GaN focused on sputter deposited indium tin oxide (ITO) films. ITO as a contact to both p-type and n-type GaN exhibits non-linear behaviour [6]. However, ITO-contacted GaN-based LEDs showed uniform luminescence, indicating effective current-spreading and hole injection [7].In this paper we report on properties of an alternative TCO contact to GaN, namely zinc oxide. Similarly to GaN, ZnO is a wide direct gap semiconductor of wurtzite structure, with a very small mismatch to GaN lattice. This study is aimed at understanding the relation between the consecutive processing steps and the final optical, electrical and structural contact characteristics. Consequently, special attention is paid to the preparation of damage-and contamination-free GaN surface, prior to ZnO deposition. ZnO was formed by oxidation of vacuum deposited zinc.