Effects of RF bias on the texture, magnetics, and recording properties of RF sputtered CoCr/Cr longitudinal thin film media

Lu, M.; Judy, H.J.; Sivertsen, J.M.

doi:10.1109/20.104454

Cited by 21 publications

(2 citation statements)

References 7 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In terms of crystallinity, strong (1 1 0) and weak (2 1 1) BCC peaks were initially observed for the metallic TiVCr alloy coatings deposited at R N = 0%. This is explained by the fact that a (1 1 0) orientation is preferred for growth because a (1 1 0) lattice plane of a BCC phase has the lowest surface energy [43]. When R N = 10%, the coatings showed a stronger (1 1 1) FCC orientation with relatively minor ones.…”

Section: Methodsmentioning

confidence: 84%

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Tsai

Huang

Lin

et al. 2011

Journal of Alloys and Compounds

View full text Add to dashboard Cite

Section: Methodsmentioning

confidence: 84%

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Tsai

Huang

Lin

et al. 2011

Journal of Alloys and Compounds

View full text Add to dashboard Cite

“…Therefore, the bcc ͑211͒ and hcp ͑110͒ diffraction peaks gradually appear in the TiVCr and TiVCrZrY films, respectively, as the bias power increases. In addition, the energetic bombardments distort the crystal lattices of the films, 45 so that large equilibrium crystallites hardly form, and the grain size of the TiVCr film with a high bias power of 15 W thus slightly decreases. Moreover, in comparison with the ternary TiVCr and quinary TiVCrZrY films, the grain sizes of the TiVCrZrY films are much smaller, and the XRD peaks are much weaker and broader.…”

Section: Discussionmentioning

confidence: 99%

Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers

Tsai

Shieu

Chang

et al. 2010

J. Electrochem. Soc.

View full text Add to dashboard Cite

In this study, TiVCr and TiVCrZrY films were deposited on Si substrates by magnetron sputtering with the application of radio-frequency substrate bias of different powers from 0 to 15 W. The crystal structures, microstructure, and mechanical, electrical, and optical properties under the effect of bias were characterized. Both the TiVCr and TiVCrZrY films constructed simple solid solutions from all alloyed elements. The TiVCr films possessed a body-centered cubic crystal structure with a pyramid-like surface, while the TiVCrZrY films had a hexagonal close-packed crystal structure with a domelike surface. The microstructure and properties of the films varied with bias power. As the bias power increased, the microstructure of the films obviously changed from a porous to a dense columnar feature, and the density of the voids existing between the columns decreased. Accordingly, the physical properties of the films were improved. The hardness of the TiVCr and TiVCrZrY films was enhanced to about 11 and 14 GPa, and the electrical resistivity was lowered to 80 and 100 mu cm, respectively

show abstract

Correlation between grain morphologies and magnetic properties of thin films

Choe¹,

Chung²,

Walser³

1995

Thin Solid Films

View full text Add to dashboard Cite

Effects of RF bias on the texture, magnetics, and recording properties of RF sputtered CoCr/Cr longitudinal thin film media

Cited by 21 publications

References 7 publications

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers

Correlation between grain morphologies and magnetic properties of thin films

Contact Info

Product

Resources

About