Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Tsai, Du-Cheng; Huang, Yen-Lin; Lin, Shiquan; Jung, De-Ru; Chang, Shou-Yi; Shieu, Fuh‐Sheng

doi:10.1016/j.jallcom.2010.12.026

Cited by 37 publications

(5 citation statements)

References 54 publications

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“…It is observed that the thickness and the deposition rate decrease continuously with increasing N2 ratio from 10% to 50%. These results agree well with several previous works were discussed the relation between the N2 gas ratio and deposition rate [29][30][31][32]. The decreasing in deposition rate can be attributed to the reduced sputtering efficiency of reactive gas ions or a lower sputtering yield resulting from the nitrogen absorption on metal target [33].…”

Section: Film Thickness and Deposition Ratesupporting

confidence: 92%

Effect of Nitrogen Gas Ratio on the Properties of Ti-Zr-N Coatings Deposited by Pulsed Magnetron Sputtering

El-Hossary

El-Rahman

Ata

et al. 2017

JES. Journal of Engineering Sciences

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The aim of this paper was to study the effectiveness of N 2 /Ar gas ratio on the mechanical and tribological properties of Ti-Zr-N films coated on (AISI 304 stainless steel) substrate. The thin films were produced at 150 W pulsed magnetron sputtering (PMS) technique operated for 90 min. The structure and tribo-mechanical properties of the Ti-Zr-N coatings were investigated at different N 2 /Ar gas pressure ratio. X-ray diffraction (XRD), microhardness, surface roughness, wear and friction, corrosion performance and surface energy were investigated. The analysis of X-ray diffraction (XRD) indicated a formation of solid solution phase of (Ti-Zr)N with (FCC) structure and a chemical compound phase of TiN. The solid solution phase (Ti-Zr)N has the orientation (111). The microhardness of the thin films has high values compared to associated value of (AISI 304 stainless steel) substrate; up to 4-folds. Furthermore, the wear performance was improved from 73.06 mm 3 /m for AISI substrate to 5.01 mm 3 /m after depositing Ti-Zr-N. The coefficient of friction was decreased from nearly 0.69 for the austenitic substrate to nearly 0.12 after coating with Ti-Zr-N. Over and above, the corrosion resistance substantially improved (factor of 1000 times) after the coating.

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Section: Film Thickness and Deposition Ratesupporting

confidence: 92%

Effect of Nitrogen Gas Ratio on the Properties of Ti-Zr-N Coatings Deposited by Pulsed Magnetron Sputtering

El-Hossary

El-Rahman

Ata

et al. 2017

JES. Journal of Engineering Sciences

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“…Transition metal-based hard coatings have been studied for last 15 years by several researchers. Hard coating via PVD methods using metal nitrides like chromium nitrides, aluminum nitrides, chromiumaluminum nitrides, and titanium nitrides [19][20][21][22] have been successfully synthesized by researchers to enhance properties like hardness, corrosion resistance properties 23 and wear resistance properties even at high temperature of about $900 C. 24,25 They have been used in decorative coatings 26 and in applications where obtaining oxidation F I G U R E 1 Classification of chemical and physical vapor deposition techniques. resistance properties is the major challenge.…”

Section: Crn-based Thin Film Preparation Through Sputtering Techniquementioning

confidence: 99%

The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical review

Tiwari,

Rao,

Kharb

et al. 2024

Surface & Interface Analysis

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Chromium‐based coatings have been of interest to researchers for the last two decades because of their extraordinary properties like high hardness, high wear, and corrosion resistance properties. However, it is in practice and research to increase the properties of Cr‐based coatings for high‐temperature applications. Numerous dopants like silicon (Si), titanium (Ti), vanadium (V), aluminum (Al), and zirconium (Zr) have been used together with Cr to achieve enhanced properties. The plasma‐based sputtering process is one of the popular and reliable techniques to deposit thin film coatings. The substrate material, processed gas and pressure, substrate temperature, film thickness, and so on also play a significant role in varying the properties and microstructure of the deposited film. Several researchers have deposited Cr/CrN‐based thin films via the chemical vapor deposition technique (CVD) and physical vapor deposition technique (PVD) to study their properties and behavior at room temperature as well as for high‐temperature applications. This work reflects the review of work done to deposit Cr/CrN‐based coatings deposited via PVD: more specifically sputtering technique. The effect of doping in the CrN matrix and variation in sputtering parameters on the properties of CrN‐based coatings have also been studied.

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“…The target constituents are all refractory, and strong nitride-forming elements are designed to deposit strong nitride coatings. In the past years, sputtered ternary (CrTiV)N coatings have exhibited a hardness of 18.74 GPa [21]. Large and heavy Ta and Zr atoms are incorporated to improve microstructure and mechanical properties, suppress grain growth, increase the energy of sputtered and backscattered atoms reaching the substrate, densify the coating structure, and enhance physical performance [22].…”

Section: Introductionmentioning

confidence: 99%

Oxidation Behavior and Structural Transformation of (CrTaTiVZr)N Coatings

Chang

Liang

2020

Coatings

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(CrTaTiVZr)N coatings were prepared on Si substrates through the reactive magnetron sputtering system to investigate the oxidation behaviors and structural evolution of the coatings at different annealing temperatures in air. The (CrTaTiVZr)N coating had a face-centered cubic structure with an oxidation temperature of up to 300 °C, but its surface changed into the amorphous oxide phase and then into the rutile TiO2 phase when the annealing temperature was increased to 500 °C. The rutile TiO2 phase continued to grow, and an additional solid solution phase of body-centered tetragonal I41/amd was formed at annealing temperatures beyond 600 °C. The high annealing temperature promoted the oxidation to progress along the thickness direction and synergistically developed the porosity. As a result, the hardness and the electrical performance of the coating deteriorated. The hardness decreased from 34.30 GPa to 1.52 GPa, and the electrical resistivity increased from 142 µΩ·cm to 17.5 Ω·cm.

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Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

Cited by 37 publications

References 54 publications

Effect of Nitrogen Gas Ratio on the Properties of Ti-Zr-N Coatings Deposited by Pulsed Magnetron Sputtering

Effect of Nitrogen Gas Ratio on the Properties of Ti-Zr-N Coatings Deposited by Pulsed Magnetron Sputtering

The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical review

Oxidation Behavior and Structural Transformation of (CrTaTiVZr)N Coatings

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