Effect of the substrate bias in diamond deposition during hot filament chemical vapor deposition: Approach by non-classical crystallization 

Abstract

The effect of the substrate bias on the diamond deposition was studied using a hot filament chemical vapor deposition (HFCVD) reactor. Both growth rate of diamonds and sp 3 /sp 2 ratio increased with increasing the substrate bias from -200 V to + 45 V. At + 60 V where the DC glow discharge occurred, however, the data deviated significantly from the tendency. These results were explained by the new concept of non-classical crystallization, where a building block of diamond growth is a charged nanoparticle rather than an atom. Based on the previously reported experimental confirmation of the gas phase generation of negatively-charged diamond nanoparticles, the bias effect on the diamond deposition behavior could be consistently explained.

Synthesis of nanostructures using charged nanoparticles spontaneously generated in the gas phase during chemical vapor deposition

“…According to the TCN, CNPs are spontaneously generated in the gas phase during CVD or PVD and they contribute to the growth of thin films and nanostructures as building blocks. Recently, Hwang et al [52][53][54][55] researched deposition behavior in silicon and diamond thin films CVD processes based on this understanding. Yoo et al [52] studied deposition behavior of silicon with different substrate bias in plasma-enhanced (PE) CVD processes.…”

“…They also compared the deposition behavior of silicon thin films to the capturing behavior of silicon nanoparticles under the same bias conditions. In addition, Park et al [54] studied the bias effect on the diamond film deposition with various substrate biases from −200 V to + 45 V in HFCVD processes.…”

Two-Step Deposition of Silicon Oxide Films Using the Gas Phase Generation of Nanoparticles in the Chemical Vapor Deposition Process

“…In the TLK model, an atom adsorbed on the terrace diffuses to the monoatomic ledge and is incorporated into the crystal at a kink. However, some deposition behaviors of thin films that are difficult to explain based on the TLK model were observed [5][6][7][8][9]. In order to explain such puzzling behavior, the concept of the two-step growth or non-classical crystallization was suggested [10][11][12][13].…”