2008
DOI: 10.1016/j.apsusc.2008.03.151
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Effect of pulse electrodeposition parameters on the properties of Ni/nano-SiC composites

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Cited by 205 publications
(102 citation statements)
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“…These peaks are assigned for nickel according to JCPDS data: 04-0850. This sharp picks represents the mixed crystalline phase of coated sample which is found to be different than the pure nickel coating as previously reported by P. Gyoftou et al [21].The highly intense (311) and (111) peak line is attributed to a dispersed[2 1 1] orientation which is responsible to higher hardness [28]. Fig .…”
Section: Distribution Of Particlessupporting
confidence: 57%
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“…These peaks are assigned for nickel according to JCPDS data: 04-0850. This sharp picks represents the mixed crystalline phase of coated sample which is found to be different than the pure nickel coating as previously reported by P. Gyoftou et al [21].The highly intense (311) and (111) peak line is attributed to a dispersed[2 1 1] orientation which is responsible to higher hardness [28]. Fig .…”
Section: Distribution Of Particlessupporting
confidence: 57%
“…The overall properties of the electrocodeposited materials depend upon the amount of incorporated nano particles in growing metal matrix and their distribution While, the incorporation of these particles depends upon the different parameters like particle characteristics [17], bath composition [18], bath temperature [19], bath pH [20], stirring rate, types of current applied, variations in current frequency, current density and duty cycle [21]. In order to maintain the particles in suspension and to enhance particles transport towards cathode surface, electrolyte agitation is required.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore pulse plating techniques are very important for the tailoring of nanocomposites. In the case of Ni-SiC co-deposition, the application of pulsed current techniques results in the production of composite coatings with higher percentages of incorporation, reduced crystallite sizes and a more uniform distribution of SiC particles in the Ni matrix than those achieved under direct current regime (Gyftou et al, 2008). In the pulsed-reverse current technique (PRC) a stripping time is introduced into the plating cycle, during which the metal surface protrusions selectively dissolves, what ensures a more uniform deposit (Chandrasekar & Pushpavanam, 2008).…”
Section: Pulse Plating Methodologymentioning
confidence: 99%
“…Otherwise, it has been observed that the amount of embedded SiC particles increases with both increasing concentration of suspended SiC particles and additives' presence in the electrolyte (Gyftou et al, 2008). Indeed the particle loading in suspension is a very important parameter.…”
Section: Wwwintechopencom Electrodeposition Of Metal Matrix Nanocommentioning
confidence: 99%
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