Effect of phase separation in an Fe20Ni80/Fe50Mn50 structure with exchange coupling

Abstract

The effect of heat treatment and partial oxidation of an Fe 50 Mn 50 layer on the structure and mag netic properties of exchange coupled Fe 20 Ni 80 /Fe 50 Mn 50 layers has been investigated. The behavior of the exchange bias field and coercive force depending on the temperature of annealing upon heat treatment in a vacuum or in an oxygen containing gas mixture has been studied. It has been shown that, by adjusting the parameters of annealing in the gas mixture, it is possible to increase the field of switching of the exchange coupled Fe 20 Ni 80 /Fe 50 Mn 50 layers.

Optimization of Functional Parameters of Magnetoresistive Fe₂₀Ni₈₀/Fe₅₀Mn₅₀/Fe₂₀Ni₈₀ Films

“…This fact can be explained by oxidizing processes taking place on the film surface in which Mn participates more actively. Impoverishment of nearsurface layers by free Mn initiates its diffusion from the depth of the layer to the surface [4]. The additional peak of low intensity observed in small-angle area can be considered as an indirect proof of the suggested assumption [ Fig.…”

“…The described above effects become especially noticeable after temperature treatment of film structures, which is necessary for attainment high level of effect of AMR [4]. In Fig.…”

Elastomagnetoresistive Properties of Films of 3d-Metalls Alloys

“…However, polycrystalline films of these materials have relatively low induced magnetic anisotropy [4], which is the reason for high magnetic hysteresis. This issue can be solved by introduction of an additional exchange coupled antiferromagnetic [12] of ferromagnetic [13] layer -the source of unidirectional magnetic anisotropy. The presence of the strong exchange coupling was demonstrated to effect strongly both magnetic anisotropy and hysteresis properties of the ferromagnetic layer [13].…”

Study of the effect of the deposition rate and seed layers on structure and magnetic properties of magnetron sputtered FeNi films

“…Furthermore, the structure of sputtered thin films depends significantly on the material of the seed layers on which a film is deposited [5][6][7][8] (Fig. 1a).…”