Study of the effect of the deposition rate and seed layers on structure and magnetic properties of magnetron sputtered FeNi films

Svalov, A. V.; Asensio, B. González; Членова, А. А.; Savin, P. A.; Larrañaga, Aitor; González, J.; Kurlyandskaya, G.V.

doi:10.1016/j.vacuum.2015.05.037

Cited by 22 publications

(6 citation statements)

References 31 publications

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“…In recent years, developments in information technology have increased the need for high-capacity digital media and computer hard disk drives suitable for it [1]. A magnetic thin film in which data is stored, and a read/write head that acts as a sensor in writing and reading the information on these thin films are among the important components of magnetic recording technology [1,2]. The properties of a magnetic thin film that leads technological applications are closely dependent on the parameters taken into account during production and the physical conditions that the samples are exposed to after production.…”

Section: Introductionmentioning

confidence: 99%

Investigation of the effects of Cu layer thickness and annealing temperature under air atmosphere on the properties of Co/Cu multilayer films

Karpuz,

Köçkar,

Kaplan

2023

Phys. Scr.

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Co/Cu films were deposited by the sputtering technique. The effects of different thicknesses of non-magnetic (Cu) layers and annealing temperature on magneto-structural properties were investigated. Different thicknesses of Cu layers were determined as 34 nm, 10 nm, 4 nm. Additionally, two annealed situations were considered to investigate the annealing effect. While the first one is exposing the films to 80 oC and 130 oC for 240 s, second one is annealing the films at 180 oC for different exposure times (50 s and 150 s). All films that have different thicknesses of Cu layers crystallized in (111) plane of the face centered cubic (fcc) structure. The intensity of this peak increased with increasing Cu layers thickness. Variation in the thickness of Cu layers has an important effect on the film surface. Saturation magnetization (Ms), coercivity (Hc) and squareness (Mr/Ms, Mr: remanent magnetization) were considerably affected by variation of the Cu content and film surface caused by the change in the thickness of the Cu layers. The film with 4 nm Cu layer thickness has the highest Ms, lowest Hc values and high Mr/Ms ratio. This indicates magnetically high efficient compared to the other films in the same series. The fcc structure continued to exist for the films annealed at 80 oC and 130 oC for 240 s. It was found that the annealing procedure transfigured the film surface and the differences in Ms and Hc values can be mostly attributed to this transfiguration because of the same film content revealed. An increase in Ms value, and a slight decrease in Hc and Mr/Ms values were detected for the annealed film at 130 oC, compared to the film annealed at 80 oC. It was also seen that the film structure was damaged at 180 oC because of excessive heat transfer.

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Section: Introductionmentioning

confidence: 99%

Investigation of the effects of Cu layer thickness and annealing temperature under air atmosphere on the properties of Co/Cu multilayer films

Karpuz,

Köçkar,

Kaplan

2023

Phys. Scr.

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“…Полученные результаты связываются с уменьшением внутренних напряжений и улучшением однородности пленок. В работе [15] исследовалось влияние скорости осаждения на свойства пленок пермаллоя толщиной d = 100 nm, выращенных при отсутствии потенциала смещения (U b = 0). При ν = 10, 18 и 28 nm/min величина H c равнялась 1.3, заземленной" подложке (U b = 0).…”

Section: Introductionunclassified

Влияние напряжения смещения и скорости осаждения на структуру и коэрцитивность пленок NiFe

Джумалиев¹,

Высоцкий²,

Сахаров³

2020

Физика Твердого Тела

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Influence of the bias voltage Ub and the deposition rate  on the structure, grain size D, and coercivity Hc of NiFe films with the thickness d from 30 to 980 nm, grown onto Si / SiO2 substrates by DC magnetron sputtering, was studied. In the case Ub = 0, the decrease of  from ≈ nm/min to ≈ 7 nm/min is accompanied by the increase of the critical film thickness dcr from dcr ≈ 220 nm to dcr ≈ 270 nm. In this case, Hc in the films with d < dcr is characterized by the dependence Hc ~ D6 and varies from ~ 1 to ~ 20 Oe. In the case of Ub = -100 V, the effect of the deposition rate on the coercivity is much more noticeable. At ν = 7 and 14 nm / min, the films demonstrate soft magnetic properties (Нс ≈ 0.15 - 1.4 Oe) and the absence of dcr for the entire range of studied thicknesses. The films obtained at ν = 21 and 27 nm / min turn into the “supercritical” state at d ≥ dcr ≈ 520 nm, and, in the region d < dcr, they are characterized by the dependence Hc ~ D3 and by the increase of coercivity from ~ 0.35 to ~ 10 Oe.

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“…The FeNi-based ternary alloy films, e.g., FeNiMo [5] and FeNiCo [6], are very important soft magnetic materials since Mo and Co have contributed on their structural and magnetic properties. They are used applied industry and commonly in magnetic sensing devices [5][6][7][8]. Various properties of FeNiCr ternary alloys have been earlier investigated in the literature for many years [9,10].…”

Section: Introductionmentioning

confidence: 99%

Easy Controlled Properties of Quaternary FeNiCrCd Thin Films Deposited from a Single dc Magnetron Sputtering Under the Influence of Deposition Rate

Köçkar

Şenturk

Karpuz

et al. 2019

J Supercond Nov Magn

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The quaternary FeNiCrCd thin films were produced from a single FeNiCrCr source on a commercial flexible polymer substrate using one dc magnetron sputtering technique. For that, a series of the films with a thickness of 50 nm were produced at different deposition rates of 0.02, 0.04, 0.06, and 0.08 nm/s, separately. In this study, as far as concerned, this was the first time that structural and magnetic properties of FeNiCrCd thin films were investigated. According to compositional analysis, the Fe and Cr contents slightly decreased with increasing deposition rate while Ni was almost constant, whereas those of the amount of Cd atoms increased. However, the atomic amounts of Fe and Cd in the films are quite different from those of the source material. The change of the atomic contents in the films from the source may be attributed to the relatively different bond energy/melting point of metals which have different contents sputtered from source material since this physical parameter is very significant for the sputtering process. For crystal structural analysis, a combination of hexagonal close-packed (hcp) and body-centered cubic (bcc) were observed. The peak intensity of the bcc-dominated planes decreased while the hcp-dominant plane increased since the change in peak intensities is compatible with the compositional analysis with increasing deposition rate. And, the grain sizes decreased gradually from 40.1 to 23.4 nm, with increasing deposition rate from 0.02, to 0.08 nm/s. Also, the film surfaces transformed from a rough to smooth surfaces with decreasing grain sizes as deposition rate increased. For magnetic analysis, the saturation magnetization M s values decreased as 1030, 773, 730, and 217 emu/cm 3 with increasing deposition rate as 0.02, 0.04, 0.06, and 0.08 nm/s, respectively. In the same manner, the coercivity H c values were found as 11, 7, 6, and 2 Oe with the deposition rate of 0.02, 0.04, 0.06, and 0.08 nm/s, respectively. The decrease of the H c may have primarily come from the transformation of rough to smooth surface of the films. It may also be said that the films showed soft magnetic properties due to their low H c values with increasing deposition rate. Thus, the magnetic properties of the quaternary FeNiCrCd alloy films were seen to be easily improved with the deposition rate parameter for potential use in different industrial applications.

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Study of the effect of the deposition rate and seed layers on structure and magnetic properties of magnetron sputtered FeNi films

Cited by 22 publications

References 31 publications

Investigation of the effects of Cu layer thickness and annealing temperature under air atmosphere on the properties of Co/Cu multilayer films

Investigation of the effects of Cu layer thickness and annealing temperature under air atmosphere on the properties of Co/Cu multilayer films

Влияние напряжения смещения и скорости осаждения на структуру и коэрцитивность пленок NiFe

Easy Controlled Properties of Quaternary FeNiCrCd Thin Films Deposited from a Single dc Magnetron Sputtering Under the Influence of Deposition Rate

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