Optimization of Functional Parameters of Magnetoresistive Fe<sub>20</sub>Ni<sub>80</sub>/Fe<sub>50</sub>Mn<sub>50</sub>/Fe<sub>20</sub>Ni<sub>80</sub> Films
Abstract:In this paper, the effect of some technological and physical factors on properties of SiO 2 /Ta/Fe 20 Ni 80 /Fe 50 Mn 50 and SiO 2 /Ta/Fe 20 Ni 80 /Fe 50 Mn 50 /Fe 20 Ni 80 /Ta films, having the anisotropic magnetoresistance (AMR) effect, was investigated. The purpose of this paper was to find the optimum conditions for realization of the peak magnetic biasing in thick (>30 nm) permalloy layers. Essential influence of the protective Ta layer on the achievement of the optimal combination of properties of multil… Show more
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