2000
DOI: 10.1016/s0026-2714(99)00295-4
|View full text |Cite
|
Sign up to set email alerts
|

Effect of oxide–semiconductor interface traps on low-temperature operation of MOSFETs

Abstract: Abstract. Operation of n-channel MOSFET was studied at low temperatures. It has been shown that the charge state of shallow traps in the Si/SiO 2 interface is responsible for the hysteresis of transistor drain characteristics in the prekink region. Thermally activated emptying of these traps leads to the sharp decrease of the current in the subthreshold mode of transistor operation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
8
0

Year Published

2002
2002
2020
2020

Publication Types

Select...
6
1
1

Relationship

0
8

Authors

Journals

citations
Cited by 16 publications
(8 citation statements)
references
References 14 publications
0
8
0
Order By: Relevance
“…The current overshoot phenomenon occurred in Fig.4(e) at temperatures below 10K other than 15K [18] or 25K [19]. This phenomenon is related to the charge state of traps in the Si/SiO 2 interface.…”
Section: Current Overshoot and Discussionmentioning
confidence: 86%
“…The current overshoot phenomenon occurred in Fig.4(e) at temperatures below 10K other than 15K [18] or 25K [19]. This phenomenon is related to the charge state of traps in the Si/SiO 2 interface.…”
Section: Current Overshoot and Discussionmentioning
confidence: 86%
“…In conventional bulk CMOS technology the major changes that need to adopt in analog circuit design are increased current factor (β) and threshold voltage (V th ) while the pronounced anomalies that have to overcome are 2 to 3 times increased mismatch compared to room temperature [9] and hysteresis and kink effect in the I-V characteristics curve of a MOS transistor. Kink occurs at the drain terminal due to the self-polarization of the bulk substrate nearly at the mid supply level [12] and on the other hand hysteresis takes place between the linear and saturation region due to the slow recharging rate of traps in the Si body and gate oxide interface [13]. Another CMOS technology -Silicon on Sapphire (SOS), specifically the fully depleted structure is reported to have superior response in room temperature and 4.2K due to the absence or less floating body effect [10], [14].…”
Section: Cryogenic Cmos Technologymentioning
confidence: 99%
“…Although it provides many advantages over room temperature like higher carrier mobility, faster switching speed, less parasitic capacit- ances and reduced interconnection delay [10,12], it also brings some drawbacks due to the dopants' inability of ionizing in low temperature. Fortunately this effect does not prevent the conduction process in a MOSFET but it gives rise to some profound nonlinearities like hysteresis [13] and kink effect [12]. Low temperature operation also gives unexpected threshold voltage variation as well as poor matching among similar devices and puts restriction on maximum power consumption.…”
Section: Cryogenic Cmos Technology Optionmentioning
confidence: 99%