2006
DOI: 10.1109/led.2006.870250
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Dual junction GaInP/GaAs solar cells grown on metamorphic SiGe/Si substrates with high open circuit voltage

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Cited by 133 publications
(85 citation statements)
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“…The modelling parameters and operating conditions were chosen to be similar to those presented in other studies. [35][36][37][38] In order to validate the mass transport effects in the EC, a comparison was made with fuel cell (FC) data available from Kim et al 38 assuming the electrolysis to be a perfectly reversible process of FC. The voltage scale was then adapted using V new = (E eq −V exp ) + E eq , where V exp is the experimentally measured voltage, V new is the adapted voltage, and E eq is the equilibrium voltage of 1.208 at 353 K, eq.…”
Section: Resultsmentioning
confidence: 99%
“…The modelling parameters and operating conditions were chosen to be similar to those presented in other studies. [35][36][37][38] In order to validate the mass transport effects in the EC, a comparison was made with fuel cell (FC) data available from Kim et al 38 assuming the electrolysis to be a perfectly reversible process of FC. The voltage scale was then adapted using V new = (E eq −V exp ) + E eq , where V exp is the experimentally measured voltage, V new is the adapted voltage, and E eq is the equilibrium voltage of 1.208 at 353 K, eq.…”
Section: Resultsmentioning
confidence: 99%
“…Typically, the compositionally step-graded 12-µm thick SiGe buffers are grown by UHC-CVD on (100) Si with 6˚offcut toward <110> plane with final composition ending in 100% Ge Lueck et al 2006). A TDD of~2.1 Â 10 6 cm −2 was reported for fully relaxed Ge layers grown on SiGe/Si substrate Lueck et al 2006).…”
Section: Si X Ge 1-x Graded Buffersmentioning
confidence: 99%
“…Typically, the compositionally step-graded 12-µm thick SiGe buffers are grown by UHC-CVD on (100) Si with 6˚offcut toward <110> plane with final composition ending in 100% Ge Lueck et al 2006). A TDD of~2.1 Â 10 6 cm −2 was reported for fully relaxed Ge layers grown on SiGe/Si substrate Lueck et al 2006). For the III-V solar cell growth, an initial epitaxial Ge layer was grown by MBE followed by the growth of GaAs on Ge at an initial low growth temperature using migration-enhanced epitaxy, details of which can be found in Refs Sieg et al 1998).…”
Section: Si X Ge 1-x Graded Buffersmentioning
confidence: 99%
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“…For these reasons different studies have been carried out to integrate Ge on Si with only a low density of defects in the active region [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%