Dry transfer bonding of porous silicon membranes to OSTE(&amp;#x002B;) polymer microfluidic devices

Saharil, Farizah; Gylfason, Kristinn B.; Liu, Yitong; Haraldsson, Tommy; Bettotti, Paolo; Kumar, Neeraj; Wijngaart, Wouter van der

doi:10.1109/memsys.2012.6170133

Cited by 11 publications

(11 citation statements)

References 8 publications

(7 reference statements)

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“…Table 1: Main components (initiators are omitted) and their used ratio in an OSTE+ formulation from literature and its relative composition used to calculate the linear attenuation coefficient. [42,43] Only Pentaerythritol tetrakis(2-mercaptoacetate) (PTMA), 1,3,5-Triallyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione (TATATO) and Bisphenol A diglycidyl ether (BADGE) are considered for the calculation 3 Results and Discussion 3.1 X-ray Compatibility…”

Section: Isolation Of Droplet and Oil Scattering Signals For The In-smentioning

confidence: 99%

OSTE+ for in situ SAXS analysis with droplet microfluidic devices

et al. 2020

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Section: Isolation Of Droplet and Oil Scattering Signals For The In-smentioning

confidence: 99%

OSTE+ for in situ SAXS analysis with droplet microfluidic devices

et al. 2020

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“…In the context of functional nanoporous materials, anodic aluminium oxide (AAO) and porous silicon are of major interest because their manufacturing is relatively low cost and is well suited for up scaling [33][34][35][36][37]. These materials can now be produced with a high level of control, in terms of pore density and size, over a full wafer area or even larger and they can be transformed to make freestanding membranes [38][39][40]. AAO membrane, especially, represents an interesting substrate for the fabrication of functional nanoporous material.…”

mentioning

confidence: 99%

Pt–Al₂O₃dual layer atomic layer deposition coating in high aspect ratio nanopores

Pardon¹,

Gatty²,

Stemme³

et al. 2012

Nanotechnology

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PostprintThis is the accepted version of a paper published in Nanotechnology. This paper has been peerreviewed but does not include the final publisher proof-corrections or journal pagination. Citation for the original published paper (version of record):Pardon, G., Gatty, H., Stemme, G., van der Wijngaart, W., Roxhed, N. (2013) Pt-Al2O3 dual layer atomic layer deposition coating in high aspect ratio nanopores. Abstract. Functional nanoporous materials are promising for a number of applications ranging from selective biofiltration to fuel cell electrodes. This work reports the functionalization of nanoporous membranes using atomic layer deposition (ALD). ALD is used to conformally deposit platinum (Pt) and aluminium oxide (Al 2 O 3 ) on Pt in nanopores to form a metal-insulator stack inside the nanopore. Deposition of these materials inside nanopores allows adding extra functionalities to nanoporous materials such as anodic aluminium oxide (AAO) membranes. Conformal deposition of Pt on such materials enables increased performances for electrochemical sensing applications or fuel cell electrodes. An additional conformal Al 2 O 3 layer on such Pt film forms a metalinsulator-electrolyte system, enabling field effect control of the nanofluidic properties of the membrane. This opens novel possibilities in electrically controlled biofiltration. In this work, the deposition of these two materials on AAO membrane is investigated theoretically and experimentally. Successful process parameters are proposed for a reliable and cost-effective conformal deposition on high aspect ratio 3D nanostructures. A device consisting of a silicon chip supporting an AAO membrane of 6 mm diameter and 1.3 μm thickness with 80 nm diameter pores is fabricated. The pore diameter is reduced to 40 nm by a conformal deposition of 11 nm Pt and 9 nm Al 2 O 3 using ALD. Nanotechnology IntroductionIn recent years, the interest for novel functional and well-controlled nanoporous materials has grown extensively [1][2][3][4][5]. Nanoporous materials possess a number of interesting features. At the nanoscale, the increased surface-to-volume ratio (~! !! ) enhances the interaction between liquid analytes or electrolyte and the device surface. In addition, the porosity,1 These authors contributed equally to this work.!, increases the effective surface area of the macroscopic material (~!). The porosity also increases the line length of triple phase (solid, liquid, gas) interfaces (~! !! ! ). The increased surface-to-volume is an advantage for surface governed phenomena, such as molecular transport in nanofluidics, largely governed by the surface charges via the electrical double layer (EDL) [6][7][8]. The increased effective surface area improves surface limited phenomena, such as overpotential losses in electrodes [9,10] and the increased line length of the triple phase interface allows increasing the current density in fuel cells [11] or the sensitivity in gas-and biosensors [12][13][14][15][16]. In addition to these intrinsic features, embedding fu...

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“…In section 3, we describe a method for integrating both por-Si membranes, and commercially available porous alumina (por-Alu) membranes, into an OSTE(+) polymeric chip, using the OSTE(+) photopatterning capability to make vias. This is an extension of our previous work [21], where through-holes were made by drilling. In section 4, we describe a method for wafer-scale integration of the por-Alu membranes onto a full silicon wafer, using a thin OSTE(+) bonding layer.…”

Section: Introductionmentioning

confidence: 73%

Dry adhesive bonding of nanoporous inorganic membranes to microfluidic devices using the OSTE(+) dual-cure polymer

Saharil

Forsberg

Liu

et al. 2013

J. Micromech. Microeng.

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Abstract. We present two transfer bonding schemes for incorporating fragile nanoporous inorganic membranes into microdevices. Such membranes are finding increasing use in microfluidics, due to their precisely controllable nanostructure. Both schemes rely on a novel dual-cure dry adhesive bonding method, enabled by a new polymer formulation: OSTE(+), which can form bonds at room temperature. OSTE(+) is a novel dual-cure ternary monomer system containing epoxy. After the first cure, the OSTE(+) is soft and suitable for bonding, while during the second cure it stiffens and obtains a Young's modulus of 1.2 GPa. The ability of the epoxy to react with almost any dry surface provides a very versatile fabrication method. We demonstrate the transfer bonding of porous silicon and porous alumina membranes to polymeric microfluidic chips molded into OSTE(+), and of porous alumina membranes to microstructured silicon wafers, by using the OSTE(+) as a thin bonding layer. We discuss the OSTE(+) dual-cure mechanism, describe the device fabrication, and evaluate the bond strength and membrane flow properties after bonding. The membranes bonded to OSTE(+) chips delaminate at 520 kPa, and the membranes bonded to silicon delaminate at 750 kPa, well above typical maximum pressures applied to microfluidic circuits. Furthermore, no change in membrane flow resistance was observed after bonding. Dry adhesive bonding of nanoporous inorganic membranes2

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Dry transfer bonding of porous silicon membranes to OSTE(+) polymer microfluidic devices

Cited by 11 publications

References 8 publications

OSTE+ for in situ SAXS analysis with droplet microfluidic devices

OSTE+ for in situ SAXS analysis with droplet microfluidic devices

Pt–Al₂O₃dual layer atomic layer deposition coating in high aspect ratio nanopores

Dry adhesive bonding of nanoporous inorganic membranes to microfluidic devices using the OSTE(+) dual-cure polymer

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Dry transfer bonding of porous silicon membranes to OSTE(&#x002B;) polymer microfluidic devices

Cited by 11 publications

References 8 publications

OSTE+ for in situ SAXS analysis with droplet microfluidic devices

OSTE+ for in situ SAXS analysis with droplet microfluidic devices

Pt–Al2O3dual layer atomic layer deposition coating in high aspect ratio nanopores

Dry adhesive bonding of nanoporous inorganic membranes to microfluidic devices using the OSTE(+) dual-cure polymer

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Product

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Dry transfer bonding of porous silicon membranes to OSTE(+) polymer microfluidic devices

Pt–Al₂O₃dual layer atomic layer deposition coating in high aspect ratio nanopores