2010
DOI: 10.1016/j.sse.2010.04.019
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Double-gate pentacene thin-film transistor with improved control in sub-threshold region

Abstract: a b s t r a c tIn this work double-gate pentacene TFT architecture is proposed and experimentally investigated. The devices are fabricated on a polyimide substrate based on a process that combines three levels of stencil lithography with standard photolithography. Similarly to the operation of a conventional double-gate silicon FET, the top-gate bias modulates the threshold voltage of the bottom-gate transistor and significantly improves the transistor sub-threshold swing and leakage current. Moreover, the dou… Show more

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Cited by 17 publications
(17 citation statements)
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“…Through these, material for the transistor gates is deposited. The stencil is manually aligned to the substrate with 2 lm [9] accuracy using a customized SUSS MA/BA 6 mask aligner [10]. The clamped substrate-stencil setup is placed in an evaporator where 100 nm thick Al gates are deposited.…”
Section: Contents Lists Available At Sciencedirectmentioning
confidence: 99%
“…Through these, material for the transistor gates is deposited. The stencil is manually aligned to the substrate with 2 lm [9] accuracy using a customized SUSS MA/BA 6 mask aligner [10]. The clamped substrate-stencil setup is placed in an evaporator where 100 nm thick Al gates are deposited.…”
Section: Contents Lists Available At Sciencedirectmentioning
confidence: 99%
“…Besides, for the transistors with intrinsic pentacene channel, the mobility is averaged to be 0.09 cm 2 V À1 s À1 , which is among the highest mobility values reported for top-gate pentacene-based organic transistors. 7,13,14 For the depletion transistors with p-doped pentacene channel, the average mobility is 0.05 cm 2 V À1 s À1 , whereas for the inversion transistors with n-doped pentacene channel, the mobility is 0.03 cm 2 V À1 s À1 . The comparatively small mobility of doped-channel transistors is related to the structural phase transition of the pentacene film from crystalline to amorphous at increased doping concentration.…”
Section: Top-gate Organic Depletion and Inversion Transistors With Domentioning
confidence: 99%
“…Through these, material for the transistor gates is deposited. The stencil is manually aligned to the substrate with 2-m [42] accuracy using a customized SUSS MA/BA6 mask aligner [43]. The clamped substrate-stencil setup is placed in an evaporator where 100-nm-thick Al gates are deposited.…”
Section: Low-temperature Fabrication Of -Si Nanowires Fetsmentioning
confidence: 99%