Point Defects in Solids 1975
DOI: 10.1007/978-1-4684-0904-8_2
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Diffusion in Semiconductors

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Cited by 14 publications
(2 citation statements)
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“…This indicates that a diffusion enhancement occurs in the presence of high energy photons. Diffusion coefficients, as calculated by Boltzmann-Matano analysis 6 using SIMS and ECV profiles, confirm the observed diffusion enhancement. Figure 2 plots the diffusion coefficient values as deduced for the different experimental configurations processed at 950°C, 25 s. As expected, the diffusion coefficient is lower for case B compared to A and C. As we turn on additional UV light ͑case C&UV, B&UV͒ the value increases clearly.…”
supporting
confidence: 71%
“…This indicates that a diffusion enhancement occurs in the presence of high energy photons. Diffusion coefficients, as calculated by Boltzmann-Matano analysis 6 using SIMS and ECV profiles, confirm the observed diffusion enhancement. Figure 2 plots the diffusion coefficient values as deduced for the different experimental configurations processed at 950°C, 25 s. As expected, the diffusion coefficient is lower for case B compared to A and C. As we turn on additional UV light ͑case C&UV, B&UV͒ the value increases clearly.…”
supporting
confidence: 71%
“…To overtake these conditions, various n-type (S, Se, Te, Si) [11][12][13][14] and p-type (Zn, Mg, C) [15][16][17] dopants have been used in MOVPE growth of GaAs. However, materials like (S, Se, Te, Zn, and Mg) show memory effects, high diffusion coefficients and have limited dopant incorporation [18][19][20][21].…”
Section: Introductionmentioning
confidence: 99%