In this article we present an alternative approach for the fabrication of silicon nanocrystals (Si–nc) prepared ex situ of the silicon dioxide (SiO2) host matrix. The Si–nc are scratched from porous silicon layers and incorporated into a host spin-on-glass SiO2 based matrix. High-resolution transmission electron microscopy and Raman spectroscopy revealed Si–nc of 2–5 nm size. These nanocrystallites exhibit visible room temperature photoluminescence (PL) with a maximum at about 700 nm. The presence of the dopant in the host matrix is shown to induce a blueshift of the PL maxima due to modified surface states of the Si–nc. This approach allows the fabrication of self-supporting samples with very high Si–nc concentrations. A bright photoluminescence at room temperature is obtained on such materials. Finally, strong indication of optical gain at room temperature is shown for samples with high Si–nc concentrations in a phosphorus doped sol gel host matrix.
Hydrogen is released from hydrogenated silicon nitride (SiNx:H) during thermal treatments. The formation of molecular hydrogen (H2) in SiNx:H layers with low mass density is confirmed by Raman spectroscopy. However, no H2 is observed in layers with a high mass density despite clear evidence that hydrogen diffuses through those layers. Therefore hydrogen migrates in those layers in a different form. This is consistent with the observed improvement of the hydrogen passivation of silicon substrates using thermally treated high density SiNx:H antireflection coatings.
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