2006
DOI: 10.1016/j.tsf.2005.08.115
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Development of high-efficiency laser Thomson scattering measurement system for the investigation of EEDF in surface wave plasma

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Cited by 8 publications
(8 citation statements)
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“…This technique has already been successfully used in several low-pressure plasma sources to estimate electron density and temperature, including in Refs. [35][36][37][38][39][40][41] or even the electron drift velocity in Ref. 42.…”
Section: Introductionmentioning
confidence: 99%
“…This technique has already been successfully used in several low-pressure plasma sources to estimate electron density and temperature, including in Refs. [35][36][37][38][39][40][41] or even the electron drift velocity in Ref. 42.…”
Section: Introductionmentioning
confidence: 99%
“…Although it is hard to measure plasma parameters in processing plasma due to using molecular species for processing gases that cause Raman scattering which makes signals distorted, its low electron density, low electron temperature and small cross section of electron itself, many researches have been performed on various plasma sources and conditions. Starting from the first measurement in Electron Cyclotron Resonance (ECR) plasma of low temperature plasma sources performed by M. Bowden, et al [3], many studies on the sources of Inductively Coupled Plasma (ICP) [4], Capacitively Coupled Plasma (CCP) [5], Magnetized Inductively Coupled Plasma (MICP) [6] and others [7][8][9] have been performed for measurements of EEPFs. Those results normally showed a typical maxwellian distribution [3,4,[6][7][8][9] or a bimaxwellian distribution [4,5,10] in high pressure or low pressure respectively, and its transition via pressure change, which is consistent with the result of probe EEPFs diagnostics [11].…”
Section: Introductionmentioning
confidence: 99%
“…Starting from the first measurement in Electron Cyclotron Resonance (ECR) plasma of low temperature plasma sources performed by M. Bowden, et al [3], many studies on the sources of Inductively Coupled Plasma (ICP) [4], Capacitively Coupled Plasma (CCP) [5], Magnetized Inductively Coupled Plasma (MICP) [6] and others [7][8][9] have been performed for measurements of EEPFs. Those results normally showed a typical maxwellian distribution [3,4,[6][7][8][9] or a bimaxwellian distribution [4,5,10] in high pressure or low pressure respectively, and its transition via pressure change, which is consistent with the result of probe EEPFs diagnostics [11]. Some of the researches have been performed to compare the LTS result with the Single Langmuir Probe (SLP) result [11,12,[12][13][14], and a research of more reliable LTS EEPFs diagnostics including a comparative result with SLP EEPFs is still needed not only to establish the reliable LTS EEPF diagnostic but also to support the uncertainty and accuracy for the SLP.…”
Section: Introductionmentioning
confidence: 99%
“…1) However, the increase in the driving frequency has caused degradation of the plasma uniformity owing to standing wave and skin effects. 2,3) As an alternative plasma source, surface wave plasmas (SWPs) excited by microwave power have been extensively studied [4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21] since the SWPs have many advantages for materials processing owing to their excellent characteristics such as high plasma density, low plasma potential, and low electron temperature. 10) Furthermore, SWPs are capable of planar plasma production because the microwave power can be distributed to a large area with the aid of surface wave propagation along the dielectric-plasma interface.…”
Section: Introductionmentioning
confidence: 99%