2007
DOI: 10.1088/1742-6596/58/1/089
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Determination of charge state, energy and angular distributions of tin ions emitted from laser produced plasma based EUV sources.

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Cited by 9 publications
(2 citation statements)
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“…This work, describing the intensity of ion distribution from a tin-based plasma for a range of charged tin ions, expands upon a previous study [17]. The source reported here is a plasma formed on a planar bulk tin target by a Nd : YAG laser delivering 270 mJ/pulse in 7-9 ns (full width at half maximum intensity) to the target at the fundamental wavelength of 1064 nm.…”
Section: Experimental Apparatusmentioning
confidence: 65%
“…This work, describing the intensity of ion distribution from a tin-based plasma for a range of charged tin ions, expands upon a previous study [17]. The source reported here is a plasma formed on a planar bulk tin target by a Nd : YAG laser delivering 270 mJ/pulse in 7-9 ns (full width at half maximum intensity) to the target at the fundamental wavelength of 1064 nm.…”
Section: Experimental Apparatusmentioning
confidence: 65%
“…Ushakov et al utilized CCP to clean the metal contaminants deposited on the FMs and effectively restored their reflectance [13]. Multilayer mirrors (MLMs) applied to collect extreme ultraviolet light also face the serious problem of reflectance reduction caused by deposition of tin, which comes from a light source in a laser-produced plasma (LPP) lithography machine [14,15]. Shin et al [16] and Sporre et al [17] utilized an ICP source and radiofrequency (RF)-driven helicon plasma source, respectively, to study the cleaning effect of hydrogen plasma on tin contaminants.…”
Section: Introductionmentioning
confidence: 99%