Determination of charge state, energy and angular distributions of tin ions emitted from laser produced plasma based EUV sources.

Morris, Oran; Hayden, P.; Dunne, Padraig; O’Reilly, Fergal; O'Sullivan, Gerry; Sokell, Emma; Antonsen, Erik L.; Srivastava, Shailendra N.; Thompson, Keith C.; Ruzic, D. N.

doi:10.1088/1742-6596/58/1/089

Cited by 9 publications

(2 citation statements)

References 6 publications

(2 reference statements)

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“…This work, describing the intensity of ion distribution from a tin-based plasma for a range of charged tin ions, expands upon a previous study [17]. The source reported here is a plasma formed on a planar bulk tin target by a Nd : YAG laser delivering 270 mJ/pulse in 7-9 ns (full width at half maximum intensity) to the target at the fundamental wavelength of 1064 nm.…”

Section: Experimental Apparatusmentioning

confidence: 65%

Angular distribution of the ion emission from a tin-based laser-produced plasma extreme ultraviolet source

Morris

O'Connor

Sokell

et al. 2010

Plasma Sources Sci. Technol.

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The charge state and energy distributions of ions emitted from a Sn-based laser-produced plasma extreme ultraviolet source, formed at a power density of ≈4 × 10 11 W cm −2 , have been recorded as a function of angle. Measurements were recorded from 20 • to 80 • with respect to the target normal. For each individual ion stage detected, more energetic ions showed preferential emission close to the target normal whereas the less energetic ions exhibited peak emission at larger angles. The peak in the observed ion emission moved to higher energies with increasing ionization at all angles. The sum of the emission, for each ion stage recorded, at each observed kinetic energy, decreased with increasing angle from the target normal.

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Section: Experimental Apparatusmentioning

confidence: 65%

Angular distribution of the ion emission from a tin-based laser-produced plasma extreme ultraviolet source

Morris

O'Connor

Sokell

et al. 2010

Plasma Sources Sci. Technol.

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“…Ushakov et al utilized CCP to clean the metal contaminants deposited on the FMs and effectively restored their reflectance [13]. Multilayer mirrors (MLMs) applied to collect extreme ultraviolet light also face the serious problem of reflectance reduction caused by deposition of tin, which comes from a light source in a laser-produced plasma (LPP) lithography machine [14,15]. Shin et al [16] and Sporre et al [17] utilized an ICP source and radiofrequency (RF)-driven helicon plasma source, respectively, to study the cleaning effect of hydrogen plasma on tin contaminants.…”

Section: Introductionmentioning

confidence: 99%

Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination

Wang

Yang

Guo

et al. 2022

Plasma Sci. Technol.

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Self-cleaning of tin contaminants was realized utilizing self-driven hydrogen plasma. Cleaning rates of 0.7-6 nm min-1 were achieved to remove discontinuous tin particles at different powers. The analysis of topography and cross-sectional morphology revealed that the removal of tin particles was achieved through top-down cleaning with hydrogen plasma, where the upper part of spherical tin particles was always more intensely cleaned under the synergistic effect of hydrogen atoms and ions due to the vertical incidence of ions to substrate during the whole cleaning process. The redeposition of tin atoms caused by physical sputtering and its promotion of the chemical cleaning effect was observed for the first time. Reflectance recovery measurements during cleaning and surface analysis of the substrate after cleaning indicated that nondestructive cleaning with reflectance loss of less than 1% can be achieved at a relatively low power of 120 W. The plasma-induced substrate damage, such as holes and valleys, reduced the reflectance of the substrate when cleaning was performed at a high power ＞120 W, which should only be considered to apply in the condition without substrate exposed. This study provides a comprehensive understanding of the removal of discontinuous tin particles using the in-situ self-driven plasma cleaning method, which also provides meaningful guidance for the extension of this method in other potential application fields.

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Energetic Sn+ irradiation effects on ruthenium mirror specular reflectivity at 13.5-nm

Allain

Nieto-Pérez²,

Hendricks

et al. 2010

Appl. Phys. A

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Sn+ irradiations of Ru single-layer mirrors (SLM) simulate conditions of fast-Sn ion exposure in high-intensity 13.5 nm lithography lamps. Ultra-shallow implantation of Sn is measured down to 1-1.5 nm depth for energies between 1-1.3 keV at near-normal incident angles on Ru mirror surfaces. The Sn surface concentration reaches an equilibrium of 55-58% Sn/Ru for near-normal incidence and 36-38% for grazing incidence at approximately 63 degrees with respect to the mirror surface normal. The relative reflectivity at 13.5 nm at 15-degree incidence was measured in-situ during Sn+ irradiation. For near-normal Sn+ exposures the reflectivity is measured to decrease between 4-7% for a total Sn fluence of 1016 cm-2. Theoretical Fresnel reflectivity modeling shows for the same fluence assuming all Sn atoms form a layer on the Ru mirror surface, that the reflectivity loss should be between 15-18% for this dose. Ex-situ absolute 13.5 nm reflectivity data corroborate these results, i ndicating that implanted energetic Sn atoms mixed with Ru reflect 13.5-nm light differently than theoretically predicted by Fresnel reflectivity models

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Determination of charge state, energy and angular distributions of tin ions emitted from laser produced plasma based EUV sources.

Cited by 9 publications

References 6 publications

Angular distribution of the ion emission from a tin-based laser-produced plasma extreme ultraviolet source

Angular distribution of the ion emission from a tin-based laser-produced plasma extreme ultraviolet source

Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination

Energetic Sn+ irradiation effects on ruthenium mirror specular reflectivity at 13.5-nm

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