No abstract

Growth of snow gum seedlings {Eucalyptus pauciflora Sieb. ex Spreng.) was studied in response to differences in microclimate caused by differential beat excbange between seedlings, grass and bare, moist soil during winter and spring. Seedlings were planted in a pasture eitber directly into grassy groundcover or in circular patcbes of bare soil of 30, 60 or 120 cm in diameter. Tbere were no differences in maximum air temperatures at seedling leaf beigbt between treatments. However, minimum air temperature increased by 2 °C witb increase in patcb diameter from 0 to 120 cm sucb tbat seedlings surrounded by grass experienced lower minimum temperatures witb more frequent and more severe frosts tban seedlings growing in large patcbes of bare soil. Tbese small-scale differences in minimum temperature affected botb pbotosyntbetic and growtb processes. Over winter, seedlings were pbotoinbibited, witb depression in midday FJF^ linearly related to minimum temperatures. In spring, repeated frosts and lower minimum temperatures led to a delay in tbe recovery of Fy/F^^j a delay in bud-break, damage to elongating stems and developing leaves, lower rates of stem elongation, and ultimately a sborter growing season for seedlings in grass compared to tbose in bare soil patcbes. Tbus, microclimate above grass adversely affects spring growtb of juvenile Eucalyptus pauciflora and may account for mucb of tbe competitive inbibition of tree seedling growtb by grass during spring.

No abstract

The primary requirement for the development of tools for extreme ultraviolet lithography (EUVL) has been the identification and optimization of suitable sources. These sources must be capable of producing hundreds of watts of extreme ultraviolet (EUV) radiation within a wavelength bandwidth of 2% centred on 13.5 nm, based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ∼70% at this wavelength. Since, with the exception of large scale facilities, such as free electron lasers, such radiation is only emitted from plasmas containing moderately to highly charged ions, the source development prompted a large volume of studies of laser produced and discharge plasmas in order to identify which ions were the strongest emitters at this wavelength and the plasma conditions under which their emission was optimized. It quickly emerged that transitions of the type 4p64dn − 4p54dn+1 + 4dn−14f in the spectra of Sn IX to SnXIV were the best candidates and work is still ongoing to establish the plasma conditions under which their emission at 13.5 nm is maximized. In addition, development of other sources at 6.X nm, where X ∼ 0.7, has been identified as the wavelength of choice for so-called Beyond EUVL (BEUVL), based on the availability of La/B based MLMs, with theoretical reflectance approaching 80% at this wavelength. Laser produced plasmas of Gd and Tb have been identified as potential source elements, as n = 4 − n = 4 transitions in their ions emit strongly near this wavelength. However to date, the highest conversion efficiency (CE) obtained, for laser to BEUV energy emitted within the 0.6% wavelength bandwidth of the available mirrors is only 0.8%, compared with values of 5% for the 2% bandwidth relevant for the Mo/Si mirrors at 13.5 nm. This suggests a need to identify other potential sources or the selection of other wavelengths for BEUVL. This review deals with the atomic physics of the highly-charged ions relevant to EUV emission at these wavelengths. It considers the developments that have contributed to the realization of the 5% CE at 13.5 nm which underpins the production of high-volume lithography tools, and those that will be required to realize BEUV lithography.

We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5–6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B4C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm (in-band: 6.7 nm ±1%) suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission.