2001
DOI: 10.1063/1.1377853
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Detection of two dangling bond centers with trigonal symmetry at and below a (100) Si/SiO2 interface

Abstract: Using electrical detection of electron paramagnetic resonance (EDEPR), two defect centers located at the Si (100)/SiO2 interface and in regions several μm below the silicon surface have been observed at a low temperature. Improvements in the EDEPR measurement technique enabled the experimental detection of the g-factor anisotropy of two centers, labeled Pba and Pbb. Both appear with a [111]-oriented, trigonally symmetric g-tensor with g∥=2.0008/g⊥=2.0098 and g∥=1.9974/g⊥=2.0160, respectively (Δg=±0.0004). The … Show more

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Cited by 5 publications
(4 citation statements)
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“…The main effects to consider are, thus, adsorption and oxidation on surfaces. Oxidation would provide a nonreversible process with the occurrence of the fingerprint of the well-known P b -centers (Si-O/Si interface dangling bond states [9,10]), but are not reported in the EPR measurements. Instead, under hydrogenation an increase of the EPR-resonance at g=2.0052 is observed [8,11].…”
mentioning
confidence: 95%
“…The main effects to consider are, thus, adsorption and oxidation on surfaces. Oxidation would provide a nonreversible process with the occurrence of the fingerprint of the well-known P b -centers (Si-O/Si interface dangling bond states [9,10]), but are not reported in the EPR measurements. Instead, under hydrogenation an increase of the EPR-resonance at g=2.0052 is observed [8,11].…”
mentioning
confidence: 95%
“…1 In 1971, dangling bond defects (P b -centers) were found at the interface, 2 and they were classified into several different types: P b for (111) and (110) interfaces and P b0 and P b1 for (100) interfaces. [3][4][5] These discoveries have stimulated experimental studies to identify structures, energy levels, and densities of the interface defects, [6][7][8][9][10][11][12][13][14] and theoretical calculations on the microscopic structures of the interface and defects. [15][16][17][18] In addition, E'-center produced by irradiation and other defects involving nitrogen, phosphorous, and boron have been identified at the interface.…”
mentioning
confidence: 99%
“…The origin of signal (1) is unclear so far. EPR signal (2) shows the typical intensity distribution and hyperfine splitting of Si dangling bond defects [9][10][11][12]. The intensity of the dangling bond signal (2) decreases about ten times in nc-Si(EtOH) and the signal disappears completely in nc-Si:H x .…”
Section: Resultsmentioning
confidence: 96%