2019
DOI: 10.1016/j.optmat.2019.109430
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Design, preparation and characterization of antireflective coatings using oxynitride films

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Cited by 4 publications
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“…For the deposition of oxynitride films, the method of DC reactive magnetron sputtering is largely used. This method is most often based on the sputtering of a metal target in a mixture of argon, oxygen, and nitrogen [168][169][170][171][172][173][174]. Let us apply the nonisothermal physicochemical model for such processes.…”
Section: Single Cold Target In Armentioning
confidence: 99%
“…For the deposition of oxynitride films, the method of DC reactive magnetron sputtering is largely used. This method is most often based on the sputtering of a metal target in a mixture of argon, oxygen, and nitrogen [168][169][170][171][172][173][174]. Let us apply the nonisothermal physicochemical model for such processes.…”
Section: Single Cold Target In Armentioning
confidence: 99%