Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers

Naulleau, Patrick; Liddle, J. Alexander; Salmassi, F.; Anderson, Erik H.; Gullikson, Eric M.

doi:10.1364/ao.43.005323

Cited by 11 publications

(5 citation statements)

References 17 publications

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“…In the X-ray band, there is also demand for the use of matte reflective surfaces, frosted screens and transparencies, not only as test objects but also to reduce the grazing angle specular beam reflection, to change spatial coherence of synchrotron radiation, for suppressing speckles in imaging optics, etc. [47][48][49]. The aforementioned numerical results on the light wave transmission through a single nanopore film allow one to draw some conclusions on the phase of the wave passing through an ensemble of randomly distributed pores, i.e.…”

Section: Track Membrane As X-ray Diffuser -Filter For Speckle Suppresmentioning

confidence: 99%

Track membranes and their replicas as high-frequency phase-contrast objects in X-ray optics

Mitrofanov¹,

Попов²,

Prokopovich³

2020

RENSIT

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Contents 1. IntroduCtIon (174) 2. When an objeCt In X-ray optICs Can be ConsIdered as phase sCreen? (175) 3. test objeCts In X-ray mICrosCopy (176) 4. Wave fIeld CalCulatIon In the fIlm WIth a sIngle pore (178) 5. phase varIatIons near nanopore In a traCk membrane (179) 6. phase veloCIty of Waves propagatIng along the aXIs of CylIndrICal nanoholes (183) 7. Track membranes as X-ray diffuser − fIlter for speCkle suppressIon (183) 8. ConversIon of phase Contrast to amplItude (184) 9. InorganIC traCk membranes and theIr replICas as phase test objeCts (185) 10. ConClusIon (187) referenCes (188)

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Section: Track Membrane As X-ray Diffuser -Filter For Speckle Suppresmentioning

confidence: 99%

Track membranes and their replicas as high-frequency phase-contrast objects in X-ray optics

Mitrofanov¹,

Попов²,

Prokopovich³

2020

RENSIT

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“…Meanwhile, patterning by grayscale lithography is fundamentally different because it aims at achieving a continuous variation of resist thickness. This thickness gradient is then used for the fabrication of a variety of micro-and nanostructures, such as microoptical interconnects [1], kinoform lenses for X-ray focusing [2], microfluidics channels of variable geometry [3], blazed gratings [4], micro-electromechanical devices [5], optical diffusers [6], and biomimetic structures [7]. The key enablers to grayscale lithography have been the ability to control the amount of energy deposited (i.e.…”

Section: Introductionmentioning

confidence: 99%

Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

Fallica

2019

Advanced Optical Technologies

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There are a growing number of applications where three-dimensional patterning is needed for the fabrication of micro- and nanostructures. Thus far, grayscale lithography is the main technique for obtaining a thickness gradient in a resist material that is exploited for pattern transfer by anisotropic etch. However, truly three-dimensional structures can only be produced by unconventional lithography methods such as direct laser writing, focused ion beam electrodeposition, colloidal sphere lithography, and tilted multiple-pass projection lithography, but at the cost of remarkable complexity and lengthiness. In this work, the three-dimensional shape of light, which is formed by Talbot effect diffraction, was exploited to produce inherently three-dimensional patterns in a photosensitive polymer. Using light in the soft X-ray wavelength, periodic three-dimensional structures of lateral period 600 nm were obtained. The position at which the sample has to be located to be in the Fresnel regime was simulated using an analytical implementation of the Fresnel integrals approach. Exploiting the light shape forming in diffraction effects thus enables the patterning of high-resolution three-dimensional nanostructures over a large area and with a single exposure pass – which would be otherwise impossible with conventional lithographic methods.

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“…Examples of such elements include gratings, diffusers, and diffractive or holographic optical elements. The fabrication of high efficiency EUV gratings [2] and diffusers [3] using reflective relief structures has already been demonstrated. Here we apply similar approaches to the fabrication of an EUV binary phase-only computer-generated hologram.…”

Section: Introductionmentioning

confidence: 99%

Holographic optical elements for the extreme-ultraviolet regime

et al. 2007

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As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such component is the diffractive optical element used, for example, in illumination systems to efficiently generate modified pupil fills. Here we demonstrate the fabrication and characterization of EUV binary phase-only computer-generated holograms allowing arbitrary far-field diffraction patterns to be generated.

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Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers

Cited by 11 publications

References 17 publications

Track membranes and their replicas as high-frequency phase-contrast objects in X-ray optics

Track membranes and their replicas as high-frequency phase-contrast objects in X-ray optics

Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

Holographic optical elements for the extreme-ultraviolet regime

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