2020
DOI: 10.1016/j.vacuum.2020.109174
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Design and regularity research of MOCVD heating plate based on experiments and simulations

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Cited by 7 publications
(2 citation statements)
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“…These extinct defects can provide strong phonon scattering, resulting in large thermal conductivity suppression [38,39], compromising their performance for LITV applications. Metalorganic chemical vapor deposition (MOCVD) is a widely used technology in the industrial production of epitaxy manufacturers due to its high efficiency and good film-forming uniformity [40,41]. It enables epitaxial growth at higher oxygen partial pressures than MBE or PLD and is more convenient to precisely control the film's chemical composition.…”
Section: Introductionmentioning
confidence: 99%
“…These extinct defects can provide strong phonon scattering, resulting in large thermal conductivity suppression [38,39], compromising their performance for LITV applications. Metalorganic chemical vapor deposition (MOCVD) is a widely used technology in the industrial production of epitaxy manufacturers due to its high efficiency and good film-forming uniformity [40,41]. It enables epitaxial growth at higher oxygen partial pressures than MBE or PLD and is more convenient to precisely control the film's chemical composition.…”
Section: Introductionmentioning
confidence: 99%
“…Uniformly heating a chuck is essential to construct uniform critical dimensions on the wafer. The etching, deposition rate, physical, electrical, optical properties, and the composition ratio of the deposited material are closely related to the temperature [1][2][3][4]. A small variation of the local temperature causes a large deviation of deposition and etching rates along the wafer.…”
Section: Introductionmentioning
confidence: 99%