2018
DOI: 10.1109/led.2018.2805785
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Delta Doped $\beta$ -Ga2O3 Field Effect Transistors With Regrown Ohmic Contacts

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Cited by 112 publications
(67 citation statements)
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“…The calculated values of the source and drain contact resistance (R C ) of all the three devices are about 80 k . R C was extracted when the gate voltage is large enough to minimize the channel resistance from output characteristics of three devices in the linear region [30], [31]. When the…”
Section: Device Fabrication and I-v Characteristicsmentioning
confidence: 99%
“…The calculated values of the source and drain contact resistance (R C ) of all the three devices are about 80 k . R C was extracted when the gate voltage is large enough to minimize the channel resistance from output characteristics of three devices in the linear region [30], [31]. When the…”
Section: Device Fabrication and I-v Characteristicsmentioning
confidence: 99%
“…Following the first Ga2O3 transistor demonstrations [3], a report by Green et al validated β-Ga2O3 as a high-power semiconductor material by fabricating a MOSFET with a breakdown electric field exceeding 3.8 MV/cm, which was the first demonstration of β-Ga2O3 having a higher breakdown field than both GaN (3 MV/cm) and SiC (3.18 MV/cm) [4]. These excellent material properties have allowed for the development of a wide variety of semiconductor devices such as high-voltage Schottky barrier diodes (SBDs) [5]- [7] and transistors with high current density [8]- [11], high breakdown voltage [3], [4], [12]- [15], radio frequency operation [11], [16], and vertical topology [17], [18]. Recently, work by Lv et al demonstrated a sourcefield-plated Ga2O3 MOSFET with a record-setting power figure-of-merit (Vbr 2 /Ron,sp) of 50.4 MW/cm 2 [19].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, even with this large band gap, βGAO can be highly doped with shallow donors such as Si and Sn, attaining free-electron concentrations n ≈ 2 × 10 20 cm −3 4 . Such high concentrations enable transparent electrodes for photovoltaics and flat-panel displays, and regrown ohmic contacts 5 . Finally, homoepitaxial device technology is possible because large βGAO crystals can be grown by several different techniques 2 .…”
Section: Introductionmentioning
confidence: 99%