2020
DOI: 10.1109/ted.2019.2951502
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Self-Heating Characterization of $\beta$ -Ga2O3 Thin-Channel MOSFETs by Pulsed ${I}$ –${V}$ and Raman Nanothermography

Abstract: β-Ga2O3 thin-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) were evaluated using both DC and pulsed I-V measurements. The reported pulsed I-V technique was used to study self-heating effects in the MOSFET channel. The device was analyzed over a large temperature range of 23 to 200°C. A relationship between dissipated power and channel temperature was established, and it was found that the MOSFET channel was heating up to 208°C when dissipating 2.5 W/mm of power. The thermal resistance of … Show more

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Cited by 21 publications
(12 citation statements)
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(40 reference statements)
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“…The lack of this data makes it difficult to compare Ga 2 O 3 with commercial device technologies (e.g., Si, SiC, GaN) and evaluate the application space of Ga 2 O 3 devices. Some recent works characterized the channel (or junction) temperatures in Ga 2 O 3 devices [12]- [15] and studied different approaches to lower device temperatures, e.g., heterogenous integration [16]- [20] and substrate thinning [21]. However, all of these devices have small areas with a current much lower than 1 Amp, and none of these devices are packaged.…”
Section: Introductionmentioning
confidence: 99%
“…The lack of this data makes it difficult to compare Ga 2 O 3 with commercial device technologies (e.g., Si, SiC, GaN) and evaluate the application space of Ga 2 O 3 devices. Some recent works characterized the channel (or junction) temperatures in Ga 2 O 3 devices [12]- [15] and studied different approaches to lower device temperatures, e.g., heterogenous integration [16]- [20] and substrate thinning [21]. However, all of these devices have small areas with a current much lower than 1 Amp, and none of these devices are packaged.…”
Section: Introductionmentioning
confidence: 99%
“…To calculate temperature, a 1 μm diameter domain probe adjacent to the drain side of the gate edge (Figure 8b,c) was used to mimic the results of Raman measurements in the literature. 50,51 It should also be noted that while the singlechannel model represented the full device geometry, in order to in these references reasonably agree with the SSTR results for the composite substrate. Figure 8d shows a comparison of the simulation results for the single-channel homoepitaxial device and the device integrated with the composite substrate.…”
Section: ■ Results and Discussionmentioning
confidence: 77%
“…The homoepitaxial 6-finger device exhibits an extremely high device thermal resistance, which is ∼2.3 times higher than that of a single-finger device due to thermal crosstalk among adjacent channel regions dissipating heat. 55 However, if the composite substrate is utilized, heat dissipation is remarkably improved, and the resulting device thermal resistance is reduced from ∼370 mm•K/W for the homoepitaxy case to ∼42 mm•K/W, which is far lower than other Ga 2 O 3 FETs reported in the literature 51 and comparable to GaN-on-Si multifinger devices. 56 These results indicate that implementing a high heat transfer performance composite substrate will be essential for cooling practical multifinger lateral FETs or reducing the device thermal resistance to a manageable level once the device technology matures.…”
Section: ■ Results and Discussionmentioning
confidence: 91%
“…Self-heating of the device die results in heterogeneous temperature distribution and may create hot spots on the die [32], [33]. This should be considered during the design; and if the device is operating close to the specified maximum temperature, a safety margin needs to be taken into consideration.…”
Section: A Trip Case Temperature Versus Operating Pointmentioning
confidence: 99%