Deep X-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics

Fabrication of Sub-Micron Structures with High Aspect Ratio for Practical MEMS

“…Fresnel diffraction and the creation of photoelectrons are important factors influencing the resolution of X-ray lithography [3]. The influence of Fresnel diffraction increases at longer wavelengths.…”

X-ray Mask with SiC Membrane for LIGA Process

“…C is given by fitting PAM at the required lithography depth to Pmin=1 kJ/cm3 found from previous work of AURORA [5,6] and PAA at the surface of the PMMA resist to PTh=0.1 kJ/cm3 [1,2]. (1).…”

“…Table 1. shows important re quirements for an X-ray mask for the LIGA process [1][2][3][4]. Au was used as an X-ray absorber for the following reasons : 1) Au is quite opaque to X-rays because of its high atomic number ; 2) An Au X-ray absorber can be made by electroforming.…”

“…In order to fabricate high aspect ratio microstruc tures, LIGA (German acronym for Lithographie, Galvanoformung, Abformung) process [1][2][3] using synchrotron radiation (SR) is one of the most prom ising techniques. The LIGA process is a technique which is a combination of deep X-ray lithography, electroforming, and molding.…”

A Study on the Sub-Micron LIGA Process

“…A typical fabrication technology for these microstructures with a high aspect ratio is the LIGA process using deep Xray lithography, electroforming and molding [4,5]. The LIGA process can fabricate microstructures with a high aspect ratio of more than 100, corresponding to less than several microns in width and more than several hundred microns in height.…”