Fabrication of Sub-Micron Structures with High Aspect Ratio for Practical MEMS

Ueno, Hiroshi; Nishi, N.; Saito, Susumu

doi:10.1541/ieejsmas.120.339

Cited by 2 publications

(1 citation statement)

References 6 publications

(7 reference statements)

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“…1) (2) Sub-micron LIGA: Our research includes fabrication of a sub-micron X-ray mask by EB direct writing using thick EB resist, taking into consideration Fresnel difiaction, the heat generation and residual stress that may influence sub-micron resolution under synchrotron radiation exposure. Sub-micron Ni structures with 0.2 pm-minimum width and 15 pm-height were fabricated [2]. (Fig.…”

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confidence: 99%

Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

Saito

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE

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At present, micro electro mechanical systems (MEMS) show great promise in becoming key devices in many industrial fields, including automobiles, measuring instruments, medical electronics, etc.. It is easy to integrate IC with MEMS that are made on a Si substrate. New functions are expected to be created using MEMS in industry. Up to now, the main process technology that has been used for manufacturing of MEMS is Si anisotropic etching and poly-Si surface micromachining. MEMS are systems composed of essentially 3-D

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mentioning

confidence: 99%

Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

Saito

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE

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Curved Resist Surface Fabrication by Scanning a Blue Laser Beam with Positional Dose Distribution

Horiuchi

Yaguchi

2001

Jpn. J. Appl. Phys.

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The occupation of the centre-of-mass quantum states of a gas layer of non-interacting bosons is studied theoretically. The atomic gas is trapped in a gravito-optical trap in one dimension, moving freely in the two transverse dimensions. The eigenfunctions and eigenvalues of the trap are considered. Using the discrete spectrum, a quantum statistical effect is shown in the longitudinal density profile, obtained by tracing over the transverse Bose-Einstein momentum distribution.

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Fabrication of Sub-Micron Structures with High Aspect Ratio for Practical MEMS

Abstract: It is necessary for practical and high performance MEMS to be fabricated microstructures with sub-micron widths and gaps (lines and spaces). In sub-micron deep X-ray lithography, one of the most crucial considerations is the fabrication of an

Cited by 2 publications

References 6 publications

Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

Curved Resist Surface Fabrication by Scanning a Blue Laser Beam with Positional Dose Distribution

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