Crystallographic and morphological characterization of reactively sputtered Ta, TaN and TaNO thin films

Stavrev, M.; Fischer, D.; Wenzel, Christian; Drescher, K.; Mattern, N.

doi:10.1016/s0040-6090(97)00319-2

Cited by 144 publications

(63 citation statements)

References 18 publications

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“…The synthesis and characterisation of tantalum nitride thin films have attracted great interest during the last years due to their different technological applications, especially as protective hard coatings and diffusion barriers in copper metallizations [1][2][3][4][5][6][7][8][9][10][11][12][13][14].…”

Section: Introductionmentioning

confidence: 99%

“…Usually, tantalum nitride thin films have been grown by reactive sputtering (RSP) [5][6][7], chemical vapour deposition (CVD) [8][9][10][11], or nitridation of tantalum in ammonia and nitrogen at high temperatures [15]. Moreover, alternative techniques like ion beam assisted deposition (IBAD) [1][2][3][4] and nitrogen implantation [12][13][14]16,17], that allow the growth of the film keeping the substrate at low or moderate temperatures, have been also used recently by several groups.…”

Section: Introductionmentioning

confidence: 99%

“…Several phases have been reported for the Ta-N system [7,15,18]. In a systematic study, of the tantalum nitridation in an atmosphere of ammonia and nitrogen at temperatures above 900K, Terao [15] has identified using x-ray diffraction (XRD) and electron diffraction, up to seven phases with increasing the nitrogen content: cubic β-TaN 0.05 , hexagonal γ-Ta 2 N, hexagonal δ-TaN, hexagonal ε-TaN, hexagonal Ta 5 N 6 , tetragonal Ta 4 N 5 and tetragonal Ta 3 N 5 .…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Composition of tantalum nitride thin films grown by low-energy nitrogen implantation: a factor analysis study of the Ta 4 f XPS core level

Arranz

Palácio

2005

Appl. Phys. A

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Composition of tantalum nitride thin films grown by low-energy nitrogen implantation: a factor analysis study of the Ta 4 f XPS core level

Arranz

Palácio

2005

Appl. Phys. A

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“…Ta-N coatings that are deposited via magnetron sputtering result in a variety of compound solutions, such as body centered cubic (bcc) TaN, hexagonal (hex) TaN, hex Ta 2 N, face centered cubic (fcc) TaN, hex Ta 5 N 6 , tetragonal Ta 4 N 5 , and orthorhombic (orth) Ta 6 N 2.5 , Ta 4 N, Ta 3 N 5 with differing physical, chemical, and mechanical properties [11][12][13][14][15][16][17][18]. The reported values of hardness for various phases of Ta-N thin films, such as hex Ta 2 N, fcc TaN, orth Ta 6 N 2.5 and orth Ta 4 N are 31, 20, 30.8, and 61.8 GPa, respectively [19][20][21][22][23][24][25].…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Zaman

Meletis

2017

Coatings

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Abstract:Reactive magnetron sputtering was used to deposit tantalum nitride (Ta-N) thin films on Si substrate. The effect of varying the N 2 percentage in the N 2 /Ar gas mixture on the Ta-N film characteristics was investigated. Mechanical and tribological properties were studied using nanoindentation and pin-on-disc wear testing. Decreasing the N 2 content in the gas mixture was found to change the film structure from face centered cubic (fcc) TaN (from 25% to 10% N 2 ) to highly textured fcc TaN (at 7% N 2 ) to a mixture of fcc TaN 1.13 and hexagonal Ta 2 N (at 5% N 2 ), and finally to hexagonal Ta 2 N (at 3% N 2 ). A high hardness of about 33 GPa was shown by the films containing the hexagonal Ta 2 N phase (5% and 3% N 2 ). Decreasing the N 2 content below 7% N 2 was also found to result in microstructural refinement with grain size 5-15 nm. Besides the highest hardness, the film deposited with 3% N 2 content exhibited the highest hardness/modulus ratio (0.13), and elastic recovery (68%), and very low wear rate (3.1 × 10 −6 mm 3 ·N −1 ·m −1 ).

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“…Given the properties of the individual elements of TaN(Ag-Cu) nanocomposite, TaN offers high hardness, good corrosion and wear resistance due to their covalent bonds, thermal and chemical stability [10][11][12]. Meanwhile soft silver and copper nanoparticles are immiscible in the TaN and incorporated into the ceramic matrix, generating a self-lubricating effect and improving the tribological properties [13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Mechanical and tribological features of TaN(Ag-Cu) duplex nanocomposite coatings: their response to heat treatment

Echavarría

Meza

2017

Ingeniare. Rev. chil. ing.

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AISI 420 martensitic stainless steel samples and silicon (100) were coated with tantalum nitride doped with copper and silver nanoparticles TaN(Ag-Cu) to improve their hardness and wear resistance. The coatings were deposited by unbalanced DC Magnetron Sputtering technique, using a tantalum target and other silver/copper composite target (50/50%at), confronted each other. The coated samples were subjected to an appropriate heat treatment at 250 ºC for 8 minutes to achieve a controlled diffusion of Ag-Cu nanoparticles to the TaN(Ag-Cu) surface. Due to their mechanical and tribological properties depend, not only on the content of Ag-Cu, but also on the size, shape and density of nanoparticles of Ag-Cu on the surface of the coating. The influence of the Ag-Cu content on the microstructure and mechanical and tribological properties of the composite coating were evaluated before and after the heat treatment was evaluated. In general terms, the microhardness and wear rate increased initially with Ag-Cu content, but then dropped down for contents higher to 0.71% at, exhibiting the lubricating effect of Ag-Cu nanoparticles in the compound before and after heat treatment. The heat treated C3 sample showed a microhardness of 15 GPa, very superior to the hardness of AISI 420 stainless steel, as well as a wear rate six orders of magnitude lower than the steel.Keywords: AISI 420, magnetron sputtering, silver and cooper nanoparticles, tantalum nitride, tribological properties. (100) coated samples. These parameters were studied in this as well. RESUMEN Se recubrieron muestras de acero inoxidable martensítico AISI 420 y de silicio EXPERIMENTAL METHODS TaN(Ag-Cu) coatings developmentTaN(Ag-Cu) coatings were deposited on AISI 420 steel plates (12.5x12.5x2.8 mm 3 ) and single crystalline silicon wafers (100) by unbalanced DC magnetron sputtering, using a tantalum target and an Ag/Cu (50-50%at) composited target, both with 99.9% purity and dimensions of 500x100x6 mm 3 . A rectangular vacuum chamber with dimensions of 500x500x800 mm 3 was used in this work.Silicon substrates were used for spectroscopic and X-ray diffraction measurements to reduce the signal from the alloying elements of steel. AISI 420 stainless steel samples were polished using SiC emery paper with grain sizes between 300 to 1200 and subsequently polished to a mirror finish until obtaining an average roughness of Ra= 0.05mm in alumina aqueous solution. The polished samples were cleaned in an ultrasonic bath with an alcoholacetone solution for 15 minutes and then subjected to argon ionic cleaning into the vaccum chamber during 30 minutes at a pressure of 1.7x10 -1 mbar and using a bias voltage of -500V applied to substrates.The nitriding process was performed into pulsed plasma conformed by Ar = 57 sccm, N 2 = 15 sccm and H 2 =27 sccm; the pressure, bias voltage and temperature of the process were fixed to 5.1x 10 -1 mbar, -600 V and 380 ºC, respectively. This process was performed for 7 hours. The low temperature of plasma nitriding was used to avoid the...

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Crystallographic and morphological characterization of reactively sputtered Ta, TaN and TaNO thin films

Cited by 144 publications

References 18 publications

Composition of tantalum nitride thin films grown by low-energy nitrogen implantation: a factor analysis study of the Ta 4 f XPS core level

Composition of tantalum nitride thin films grown by low-energy nitrogen implantation: a factor analysis study of the Ta 4 f XPS core level

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Mechanical and tribological features of TaN(Ag-Cu) duplex nanocomposite coatings: their response to heat treatment

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