Convective assembly of two-dimensional nanosphere lithographic masks

Characterization of Complex Spintronic and Superconducting Structures by Atomic Force Microscopy Techniques

“…Co nanostructures were obtained using the polystyrene nanosphere lithography, a method described in detail in (Canpean et al, 2009). 170 nm and 40 nm thick films were deposited on a nanoshpere patterned Si substrate.…”

Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching

“…8 There are four types of self-assembly masks: metal, nanospheres, copolymer, and deliquescent salts. Metal nanodots (Ag) 9 can easily contaminate substrates and are hard to remove, diversified inorganic (silica) 10 and organic (colloids) 11 nanospheres tend to agglomerate, copolymer micells' 12 diameter is limited, while deliquescent salt masks have the advantages of easy mask removing, high etch selectivity, high coverage, wide diameter range and compatibility. CsCl is one of such deliquescent salts and it's easy to acquire.…”