1996
DOI: 10.1016/s0921-5107(96)01698-4
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Comparison among lifetime techniques for the detection of transition metal contamination

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Cited by 33 publications
(39 citation statements)
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“…For high (low) values of S b , L is highly underestimated (overestimated) by L app . Unrealistically large and small apparent diffusion lengths correlated with low and high S b , respectively, have indeed been observed by several groups [429,513,547,548]. The demarcation line between the two phenomena lies at S b DaL, for which L app L, regardless of sample thickness.…”
Section: Limitations and Solutionsmentioning
confidence: 65%
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“…For high (low) values of S b , L is highly underestimated (overestimated) by L app . Unrealistically large and small apparent diffusion lengths correlated with low and high S b , respectively, have indeed been observed by several groups [429,513,547,548]. The demarcation line between the two phenomena lies at S b DaL, for which L app L, regardless of sample thickness.…”
Section: Limitations and Solutionsmentioning
confidence: 65%
“…It is therefore clear that even if there is no direct excitation of the back part of the sample (i.e., condition (5.7c), 1a ( l, is maintained), the sample cannot be treated as semi-in®nite and the effects of the back surface must be taken into account. While Goodman plots made when condition (5.7c) is not valid frequently remain highly linear, it is clear that use of the simple equations (2.61) or (5.3) should yield an erroneous value of L. Indeed, comparisons between SPV and PCD [445,547], mPCD [429,430], or electrolytic metal tracing (ELYMAT) [430,548] measurements on Si indicated a very good agreement for large sample thicknesses and a poor one for sample thicknesses approaching the diffusion length. In recent years, this has become a more and more pressing problem, especially in industrially-oriented monitoring of Si wafers, due to the improvement in Si wafer quality.…”
Section: Limitations and Solutionsmentioning
confidence: 99%
“…The material properties of the silicon used for the device fabrication are decisive for their performance [140][141][142][143][144][145][146][147][148][149][150][151][152][153]. Therefore in research or on an assembly line, it is obligatory to assess the quality of wafers prior to fabrication into devices.…”
Section: Lifetime Measurements In Silicon Blocksmentioning
confidence: 99%
“…The maps thus drawn often reveal images of contamination sources. The best acknowledged examples of this kind are the surface photovoltage (SPV) method, measuring the variation of surface potential upon illumination, the detection of photoconductivity decay by microwave reflection (m-PCD), and measurements of the photocurrent collected by a silicon-electrolyte contact (Elymat) [151,152].…”
Section: Lifetime Measurements In Silicon Blocksmentioning
confidence: 99%
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