2018
DOI: 10.1364/oe.26.021594
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Compact epsilon-near-zero silicon photonic phase modulators

Abstract: In this paper, we analyze a compact silicon photonic phase modulator at 1.55 μm using epsilon-near-zero transparent conducting oxide (TCO) films. The operating principle of the non-resonant phase modulator is field-effect carrier density modulation in a thin TCO film deposited on top of a passive silicon waveguide with a CMOS-compatible fabrication process. We compare phase modulator performance using both indium oxide (InO) and cadmium oxide (CdO) TCO materials. Our findings show that practical phase modulati… Show more

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Cited by 35 publications
(17 citation statements)
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“…These oxides are an alternative to the classical plasmon materials, such as silver and gold [24][25][26][27][28][29]. They are attractive due to the possibility of implementing the high nonlinearity [30][31][32], designing modulators [33] and polarization devices [34], bending the wave front [35] and creating absorbers [36] and insulators [37]. All this was obtained due to the unique dispersion properties of the TCOs in the epsilon-near-zero wavelength range.…”
Section: Introductionmentioning
confidence: 99%
“…These oxides are an alternative to the classical plasmon materials, such as silver and gold [24][25][26][27][28][29]. They are attractive due to the possibility of implementing the high nonlinearity [30][31][32], designing modulators [33] and polarization devices [34], bending the wave front [35] and creating absorbers [36] and insulators [37]. All this was obtained due to the unique dispersion properties of the TCOs in the epsilon-near-zero wavelength range.…”
Section: Introductionmentioning
confidence: 99%
“…This indicates that the epsilon-near-zero point can be chosen when we change the operating wavelength and the initial electron concentration. We can thus adjust the deposition conditions to shift the operating wavelengths of ITO for specific applications [29].…”
Section: Device Structure and Principlementioning
confidence: 99%
“…This limits the integration density and increases the overall cost. To resolve this issue, a variety of CMOS-compatible materials such as vanadium dioxide (VO2) 6 , barium titanate (BTO) 7 , germanium antimony telluride (GST) 8 , and indium-tin-oxide (ITO) [9][10][11][12][13][14][15][16][17][18][19][20] , have been studied as the active material of optical modulators. Among these materials, ITO has drawn considerable attention because of its fast and widely tunable FCD effect and epsilon near zero (ENZ) property 10 .…”
Section: Introductionmentioning
confidence: 99%