2012
DOI: 10.1117/12.921747
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Co-integration of Ge detectors and Si modulators in an advanced Si photonics platform

Abstract: A Si photonics platform is described, co-integrating advanced passive components with Si modulators and Ge detectors. This platform is developed on a 200mm CMOS toolset, compatible with a 130nm CMOS baseline. The paper describes the process flow, and describes the performance of selected electro-optical devices to demonstrate the viability of the flow.

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Cited by 10 publications
(7 citation statements)
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“…The devices were fabricated in imec's silicon photonics platform [4] on an SOI wafer with 220nm silicon on a 2µm buried oxide. First, the passive waveguides are processed.…”
Section: A Fabricationmentioning
confidence: 99%
“…The devices were fabricated in imec's silicon photonics platform [4] on an SOI wafer with 220nm silicon on a 2µm buried oxide. First, the passive waveguides are processed.…”
Section: A Fabricationmentioning
confidence: 99%
“…To assess the dark current the voltage was then varied between 0 and −10 V. The results are shown in Figure 5a, indicated values lower than 0.1 nA. These values are much lower than those reported in [5,6], Table 1. The devices were then packaged using a PCB board and the responsivity was assessed by measuring the difference in current observed for different light intensities, Figure 5b.…”
Section: Resultsmentioning
confidence: 62%
“…A single-sideband generation and coherent detection technology has been employed to measure the phase of the transmitted optical signal around the resonant wavelength of the SOI ring resonator, which exhibits a rapid variation when the cladding material changes. The extra modulator and the coherent detection technology only need to work at a single frequency, and can be integrated on-chip together with the sensing SOI ring [20]. Therefore, the proposed phase interrogation approach is easy to implement and can have a high integration density.…”
Section: Discussionmentioning
confidence: 99%