2017 Symposium on VLSI Technology 2017
DOI: 10.23919/vlsit.2017.7998174
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CMOS-embedded STT-MRAM arrays in 2x nm nodes for GP-MCU applications

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Cited by 35 publications
(16 citation statements)
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“… When it comes to implementing the above as memory arrays, such arrays are currently focused on crossbar array architectures that typically make use of either phase-change materials (see [ 173 , 174 ]) or resistive materials (see [ 43 ], [ 175 , 176 , 177 ]). More work is still needed on realizing memory arrays using either FeRAM or MRAM, though there have already been some successes in constructing STT-MRAM memory arrays [ 178 ], and there have also been some notable moves in this direction using SOT-MRAM lately [ 179 ]. By and large, this paper has focused on discussing single device implementations and how they might be used for logic operations, but constructing larger-scale non-volatile memory arrays has also been given substantial treatment in the literature and significant progress has been made [ 180 , 181 ].…”
Section: Discussionmentioning
confidence: 99%
“… When it comes to implementing the above as memory arrays, such arrays are currently focused on crossbar array architectures that typically make use of either phase-change materials (see [ 173 , 174 ]) or resistive materials (see [ 43 ], [ 175 , 176 , 177 ]). More work is still needed on realizing memory arrays using either FeRAM or MRAM, though there have already been some successes in constructing STT-MRAM memory arrays [ 178 ], and there have also been some notable moves in this direction using SOT-MRAM lately [ 179 ]. By and large, this paper has focused on discussing single device implementations and how they might be used for logic operations, but constructing larger-scale non-volatile memory arrays has also been given substantial treatment in the literature and significant progress has been made [ 180 , 181 ].…”
Section: Discussionmentioning
confidence: 99%
“…To guarantee a high-quality test solution and improve the manufacturing process itself so as to improve yield, understanding all potential defects is of great importance. The STT-MRAM manufacturing process mainly consists of the standard CMOS fabrication steps and the integration of MTJ devices into metal layers (e.g., between M4 and M5 layers [29,30]). Fig.…”
Section: Defect Space and Classificationmentioning
confidence: 99%
“…Among the various emerging memory technology described in Sect. 5.1, STT-MRAM is attracting a strong interest as storage-class memory (SCM) [5,10], DRAM replacement [11], and embedded nonvolatile memory [12], due to its fast switching, non-volatility, high endurance, CMOS compatibility and low current operation [13]. In addition, STT-RAM and spintronic devices in general can be implemented in novel non-von Neumann concepts of computing, e.g., as electronic synapse in neural networks [14], nonvolatile logic [15], and random number generator (RNG) [16].…”
Section: Spin-transfer Torque Magnetic Memory (Stt-mram)mentioning
confidence: 99%