Characterization of microroughness parameters in Cu-C nanocomposite prepared by co-deposition of RF-sputtering and RF-PECVD

Preparation and magnetoresistance behavior of nickel nanoparticles embedded in hydrogenated carbon film

“…Arrays of nickel nanoparticles (Ni NPs) on carbon substrates with different Ni NPs concentrations were grown using simultaneously RF-sputtering with a Ni target and RF-PECVD following a procedure similar to that described elsewhere [15][16][17][18][19][20]. The used experimental arrangement consisted of a steel sample chamber connected to two rotary and diffusion pumps, and two electrodes of different area size; the smallest electrode was a nickel target electrode with a diameter of 7.5 cm and powered by a RF power supply.…”

“…In this matter, the sputtering [12,13] and the chemical vapor deposition techniques [14] have been especially relevant, and their versatility have recently combined to prepare nanocomposite films [15][16][17][18][19][20].…”

Microstructure and Tribological Properties of FeNPs@a-C:H Films by Micromorphology Analysis and Fractal Geometry

“…All these methods allow fine control for chemical composition and introduction of the lowest possible concentrations of finely dispersed dopants. [23][24][25][26] Different techniques, including Surface Plasmon Resonance (SPR) absorption 1,27 and Power Spectral Density (PSD), 28 were applied in order to study the chemistry and nanoscale architecture of continuous thin films with metallic nanoparticles less than 100 nm deposited on various substrates. The objective of this study is to synthesize the Fe NPs @ a-C: H films by co-deposition of RF-PECVD and RF-sputtering methods on quartz substrates, and to characterize their 3-D surface 3 texture using AFM data in connection with the statistical, and fractal analyses, to elucidate the 3-D fractal patterns of the heterogeneous components.…”

Gold nanoparticles embedded in carbon film: Micromorphology analysis

“…19 Extensive integration of interdisciplinary research of 20 nanomanufacturing processes establishes safety standards to 21 develop robust protocols for technological transition of 22 nanoscience to practical products of thin films [5][6][7][8][9]. 23 The engineering surface design of thin films requires a 24 simultaneous need for high-resolution and high-sensitivity 25 techniques for characterization of thin film microstructures at 26 the nanometer level and thus to relate material structures to 27 material properties [10][11][12][13][14][15].…”

“…41 In several past decades, for the preparation of metal nano-42 particles (NPs) numerous physical and chemical techniques such 43 as: RF-sputtering, RF-PECVD, hydrothermal reduction, and sol-gel 44 method have been developed that allows fine control of chemical 45 composition and the introduction of lowest concentrations of 46 finely dispersed dopants [20][21][22][23]. 47 This work aims to synthesize the Au NPs @ a-C: H films by PECVD deposition method on the glass substrates, to study the 49 structure of films using XRD pattern, to discuss the LSPR peaks 50 position by UV-vis spectra, also to characterize the 3-D surface 51 texture using AFM data in connection with the statistical, and 52 fractal analyses.…”