Abstract:Carbon doping efficiency in GaAs grown by metalorganic chemical vapor deposition using intrinsic and extrinsic doping sources is studied. Independent of the carbon source, carbon hydrogen complexes are systematically present and depending on the growth conditions, carbon dimers can be present and form complexes with hydrogen as well. Carbon–hydrogen related complexes and dimers reduce the hole concentration decreasing the doping efficiency. Additionally, the carbon dimer introduces a deep level, decreases the … Show more
“…Intrinsic carbon incorporation in MOVPE-grown GaAs layers is enhanced at low growth temperatures and V/III stoichiometric ratio between the metalorganic precursors in the vapour phase, due to the incorporation of methyl radicals on substitutional As sites [6]. Doping levels as high as 10 19 cm -3 were obtained for GaAs by using trimethyl gallium (TMGa) and arsine (AsH 3 ) or trimethyl arsenic (TMAs) [7,8].…”
In this work the possibility of controlling carbon intrinsic-doping in GaAs homoepitaxial layers grown by metalorganic vapour phase epitaxy (MOVPE) from the trimethyl-gallium (TMGa) and tertiary-buthylarsine (TBAs) precursors was evaluated via the analysis of transport properties as a function of the growth parameters and for two substrates mis-orientations; Hall effect measurements were performed on the samples as a function of temperature. Intrinsically p-doped GaAs layers were obtained with a hole concentration in the range (10 14 -10 18 ) cm -3 and a corresponding RT mobility in the range (100 -400) cm 2 /Vs. The simultaneous analysis of the Hall free hole density and Hall mobility yielded the effective doping level, the compensation ratio and the thermal ionisation energy of the acceptor impurity as a function of the growth parameters.
“…Intrinsic carbon incorporation in MOVPE-grown GaAs layers is enhanced at low growth temperatures and V/III stoichiometric ratio between the metalorganic precursors in the vapour phase, due to the incorporation of methyl radicals on substitutional As sites [6]. Doping levels as high as 10 19 cm -3 were obtained for GaAs by using trimethyl gallium (TMGa) and arsine (AsH 3 ) or trimethyl arsenic (TMAs) [7,8].…”
In this work the possibility of controlling carbon intrinsic-doping in GaAs homoepitaxial layers grown by metalorganic vapour phase epitaxy (MOVPE) from the trimethyl-gallium (TMGa) and tertiary-buthylarsine (TBAs) precursors was evaluated via the analysis of transport properties as a function of the growth parameters and for two substrates mis-orientations; Hall effect measurements were performed on the samples as a function of temperature. Intrinsically p-doped GaAs layers were obtained with a hole concentration in the range (10 14 -10 18 ) cm -3 and a corresponding RT mobility in the range (100 -400) cm 2 /Vs. The simultaneous analysis of the Hall free hole density and Hall mobility yielded the effective doping level, the compensation ratio and the thermal ionisation energy of the acceptor impurity as a function of the growth parameters.
“…If carbon would be incorporated on interstitial sites, an effect on the lattice contraction would be expected. It is reported that carbon-hydrogen and carbon dimer complexes in as-grown GaAs reduce the electrical activation degree of carbon acceptors [7]. We believe this to be true for AlGaAs as well.…”
“…As seen in Fig. 3, the V/III ratio of 0.7 contains C-H and C 2 -H complexes; however, only the C-H complex accounts for the gain-drift because the C 2 -H complex does not ionize at RT due to its deep acceptor level [18]. We thus conclude that the V/III ratio of 25 contains less of C-H complex and no C 2 -H complex, which leads to a high thermal stability.…”
Section: Hydrogen-related Defects In P-gaasmentioning
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