Broadening of Cr nanostructures in laser-focused atomic deposition

Abstract

This paper presents the experimental progress of laser-focused Cr atomic deposition and the experimental condition. The result is an accurate array of lines with a periodicity of 212.8±0.2 nm and mean full-width at half maximum as approximately 95 nm. Surface growth in laser-focused Cr atomic deposition is modeled and studied by kinetic Monte Carlo simulation including two events: the one is that atom trajectories in laser standing wave are simulated with the semiclassical equations of motion to obtain the deposition position; the other is that adatom diffuses by considering two major diffusion processes, namely, terrace diffusion and step-edge descending. Comparing with experimental results

Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field

“…[6,7] Our group has also fabricated a standard nano structure by use of the atom lithography. [8,9] Recently, the atom focusing characteristics of the nontraditional Gaussian optical fields also have been analyzed. [10] In former research, Arun et al [11] have investigated the atomlithography with multi-layer light masks.…”

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

“…[7] The broadening of Cr nanostructures has been studied. [8] Other relevant work covers the influence of the divergence angle on deposition of neutral atoms [9] and one-dimensional (1D) collimation of the chromium beam. [10,11] In order to realize the 2D nanolattice, the atomic beam must be transversely collimated in two dimensions.…”