Laser-focused Cr atomic deposition pitch standard as a reference standard

Lei, Lihua; Li, Yuan; Xiao, Deng; Fan, Guofang; Cai, Xiaoyu; Cheng, Xinbin; Weng, Junjing; Liu, Gang; Li, Tongbao

doi:10.1016/j.sna.2014.11.006

Cited by 8 publications

(3 citation statements)

References 25 publications

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“…The connection between laser-focused molecular deposition and incident laser frequency thus opens the possibility of creating a nanoscale length standard up to a highly accurate, constant, physically measurable quantity. The standing wave has a periodicity that is essentially as well determined as the stabilized laser frequency, and this degree of certainty transfers nearly perfectly to the deposited structure, resulting in an inherently well-characterized pitch 42 , 43 . Furthermore, our scheme allows the standing wave fields formed by SPPs to be switched easily and modified quickly, offering a favorable flexibility to the deposition points of different patterns.…”

Section: Resultsmentioning

confidence: 99%

2D surface optical lattice formed by plasmon polaritons with application to nanometer-scale molecular deposition

Yin

et al. 2017

Sci Rep

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Surface plasmon polaritons, due to their tight spatial confinement and high local intensity, hold great promises in nanofabrication which is beyond the diffraction limit of conventional lithography. Here, we demonstrate theoretically the 2D surface optical lattices based on the surface plasmon polariton interference field, and the potential application to nanometer-scale molecular deposition. We present the different topologies of lattices generated by simple configurations on the substrate. By explicit theoretical derivations, we explain their formation and characteristics including field distribution, periodicity and phase dependence. We conclude that the topologies can not only possess a high stability, but also be dynamically manipulated via changing the polarization of the excitation laser. Nanometer-scale molecular deposition is simulated with these 2D lattices and discussed for improving the deposition resolution. The periodic lattice point with a width resolution of 33.2 nm can be obtained when the fullerene molecular beam is well-collimated. Our study can offer a superior alternative method to fabricate the spatially complicated 2D nanostructures, with the deposition array pitch serving as a reference standard for accurate and traceable metrology of the SI length standard.

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Section: Resultsmentioning

confidence: 99%

2D surface optical lattice formed by plasmon polaritons with application to nanometer-scale molecular deposition

Yin

et al. 2017

Sci Rep

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“…Nanoscale length standards for nanometrology include linewidth, step height, nano particle size, line pattern scale, pitch (1D) and grid (2D) standards, and so on [5]. Atom lithography has been a technique for creating 1D and 2D gratings based on the interactions of light with atoms [6][7][8][9][10][11][12][13][14]. The pitch fabricated by this technique is directly traceable to the standing laser wavelength, which is selected to match the transition frequency of the deposited atoms.…”

Section: Introductionmentioning

confidence: 99%

Linewidth characterization of a self-traceable grating by SEM

Guo,

Miao,

Mao

et al. 2024

J. Phys. D: Appl. Phys.

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In order to achieve high-precision nanometrology, a self-traceable grating reference material has been reported and prepared by atom lithography and soft X-ray interference techniques (J. Liu et al., Nanotechnology 32 (2021) 175301). In this work we employ a Monte Carlo simulation method to study the scanning electron microscopy (SEM) image contrast and linewidth characterization of the grating linewidth. The 3D structure of the mushroom-shaped grating line made of the multilayer (Pt, SiO2 and Si) is modeled according to the transmission electron microscopy (TEM) image, enabling the SEM linescan profiles of secondary electron signals to be obtained for different values of structural linewidth parameter from Monte Carlo simulations. In the light of the principle of the model-based library method a model database of Monte Carlo simulated SEM linescan profiles by varying the incident electron beam conditions and the grating linewidths is thus constructed; then the grating linewidth has been successfully characterized with experimental SEM image. By comparison with the TEM measurement, the measurement accuracy is verified to within 0.3% for the linewidth of ~25 nm.

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“…The traditional one-dimensional atomic lithography technology can be utilized to prepare one-dimensional selftraceable gratings with a period of λ /2, whose period is selftraced to the wavelength corresponding to the transition energy level 7 S 3 → 7 P 0 4 of the chromium atom [9,10] , and has been recognized as a national first-class standard substance with a nanometer length. [11] In order to reduce the pitch further, three methods have been proposed: positive and negative frequency detuning, [12][13][14] polarization gradient, [15] and multi-beam interference.…”

Section: Introductionmentioning

confidence: 99%

Simulation research on surface growth process of positive and negative frequency detuning chromium atom lithographic gratings

et al. 2023

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Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy, uniformity, and consistency. However, the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography, which greatly reduces its accuracy. In this study, we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings. We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters. Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency, and adjacent peak-to-valley heights differing by no more than 2 nm, providing an important theoretical reference for the controllable fabrication of these gratings.

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Laser-focused Cr atomic deposition pitch standard as a reference standard

Cited by 8 publications

References 25 publications

2D surface optical lattice formed by plasmon polaritons with application to nanometer-scale molecular deposition

2D surface optical lattice formed by plasmon polaritons with application to nanometer-scale molecular deposition

Linewidth characterization of a self-traceable grating by SEM

Simulation research on surface growth process of positive and negative frequency detuning chromium atom lithographic gratings

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