Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

Abstract

Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to make further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7 S 3 → 7 P 0 4 of the chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and success of our structured mirror array is achieved.

Fabrication and measurement of traceable pitch standard with a big area at trans-scale

“…Atom lithography has been successfully demonstrated using Na, [4] Cr, [5,6] Al, [7] Yb, [8] and Fe [9] atoms deposited onto a substrate through a laser standing wave (SW) grazing across the surface. In addition, λ /4 (106.4 nm), [10] λ /8 (53.2 nm) [11] pitch standards and hexagonal nanostructures [6] have been generated by light marks for neutral Cr atoms. Recently, a structured mirror array [12] has been designed for the twodimensional collimation of Cr beams.…”

Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field

“…[6,7] Our group has also fabricated a standard nano structure by use of the atom lithography. [8,9] Recently, the atom focusing characteristics of the nontraditional Gaussian optical fields also have been analyzed. [10] In former research, Arun et al [11] have investigated the atomlithography with multi-layer light masks.…”