Fabrication and measurement of traceable pitch standard with a big area at trans-scale

Xiao, Deng; Li, Tongbao; Lei, Lihua; Ma, Yan; Ma, Rui; Jun-Jing, Weng; Li, Yuan

doi:10.1088/1674-1056/23/9/090601

Cited by 9 publications

(6 citation statements)

References 19 publications

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“…(1) In practice, during the fabrication process of the grating, factors such as an uneven standing wave field, insufficient atomic collimation, and substrate edge diffraction can affect the atomic lithography deposition conditions, resulting in a grating structure that is not an ideal sinusoidal structure [15]. (2) The manufacturing size in the fabrication process of self-traceable grating limits the diffraction efficiency.…”

Section: Experiments and Resultsmentioning

confidence: 99%

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

Lei,

Liang,

Liu

et al. 2024

Photonics

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Measurement traceability is a prerequisite for achieving accurate and reliable results as well as technical standardization. The period of Chromium (Cr) gratings fabricated by atomic lithography can be directly traced back to natural constants. Applying the Cr grating to grating interferometry can achieve nanometer measurement traceability. This research aims to analyze the diffraction efficiency characteristics of self-traceable Cr gratings to provide a theoretical basis for the fabrication and application of Cr gratings. In this regard, we establish the theoretical model of the laser beam incident angle and grating diffraction efficiency using the rigorous coupled-wave method. Then, we analyze the influence of the laser beam incident angle on grating diffraction efficiency by simulation, verify the accuracy of the theoretical model, and finally build a measurement system for grating diffraction efficiency. Through experiments, we find that the diffraction efficiency of the grating shows a rapid increase to reach a stable maximum value followed by a decrease, when a laser beam with a wavelength of 405 nm is incident on the surface of a self-traceable grating in Transverse Magnetic (TM) polarization and the incident angle changes within an effective range. The experimental results are consistent with the trend of theoretical calculation results.

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Section: Experiments and Resultsmentioning

confidence: 99%

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

Lei,

Liang,

Liu

et al. 2024

Photonics

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“…11) The above method revealed an intensity dependence of the resonant standing-wave focusing properties, because the intensity and thus Rabi frequency change owing to the Gaussian profile of the light field. Therefore, the peak-tovalley height of the nanostructure conformed with a Gaussian distribution corresponding to the Gaussian distribution of the laser standing wave, 12,13) which is shown in Fig. 2.…”

mentioning

confidence: 85%

Nanofabrication of millimeter-level nanostructure via laser-focused atomic deposition

Zhang¹,

Yin²,

Zhao³

et al. 2018

Appl. Phys. Express

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We describe the fabrication of a large area of chromium nanogratings formed by laser focusing techniques. The focusing occurs in an elliptical laser standing-wave field, resulting in a line array covering an area of approximately 1.5 ' 1.5 mm 2 with a spacing of 212.78 nm. The experimental arrangement for laser focusing is described. Improvements in the technique and potential applications are also mentioned.

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“…Types of atom lenses: (a) thin lens, (b) thick lens, and (c) channeling. [13] The optical potential well in the laser standing wave can be expressed as [14] U…”

Section: Theoretic Analysismentioning

confidence: 99%

Optimization of laser focused atomic deposition by channeling*

Chen¹,

Liu²,

Zhu³

et al. 2020

Chinese Phys. B

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Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom–light interaction theory, channeling is utilized to improve the stability and repeatability. From the comparison of three kinds of atom–light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.

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Fabrication and measurement of traceable pitch standard with a big area at trans-scale

Abstract: Fabrication and measurement of traceable pitch standard with a big area at trans-scale * Deng Xiao(邓晓) a) , Li Tong-Bao(李同保) a) † , Lei Li-Hua(雷李华) a)b) , Ma Yan(马艳) a) , Ma Rui(马蕊) a) , Weng Jun-Jing(翁浚婧) a)b) , and Li Yuan(李源) b)

Cited by 9 publications

References 19 publications

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

Nanofabrication of millimeter-level nanostructure via laser-focused atomic deposition

Optimization of laser focused atomic deposition by channeling*

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Fabrication and measurement of traceable pitch standard with a big area at trans-scale

Abstract: Fabrication and measurement of traceable pitch standard with a big area at trans-scale * Deng Xiao(邓 晓) a) , Li Tong-Bao(李同保) a) † , Lei Li-Hua(雷李华) a)b) , Ma Yan(马 艳) a) , Ma Rui(马 蕊) a) , Weng Jun-Jing(翁浚婧) a)b) , and Li Yuan(李 源) b)

Cited by 9 publications

References 19 publications

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

Nanofabrication of millimeter-level nanostructure via laser-focused atomic deposition

Optimization of laser focused atomic deposition by channeling*

Contact Info

Product

Resources

About

Abstract: Fabrication and measurement of traceable pitch standard with a big area at trans-scale * Deng Xiao(邓晓) a) , Li Tong-Bao(李同保) a) † , Lei Li-Hua(雷李华) a)b) , Ma Yan(马艳) a) , Ma Rui(马蕊) a) , Weng Jun-Jing(翁浚婧) a)b) , and Li Yuan(李源) b)