31st Annual Proceedings Reliability Physics 1993 1993
DOI: 10.1109/relphy.1993.283289
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Bias temperature reliability of n/sup +/ and p/sup +/ polysilicon gated NMOSFETs and PMOSFETs

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Cited by 10 publications
(3 citation statements)
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“…5 between NMOS and PMOS at V at elevated temperature K. According to the generation of donor-like [8], we observed identical power-law time dependencies with an exponent for both N-and P-MOS independently of the vertical field polarity. The NBTI result exhibits the same in NMOS and PMOS, and reaches roughly eV cm .…”
Section: Interface Traps Generation Versus Oxide Charge Under N-ansupporting
confidence: 54%
“…5 between NMOS and PMOS at V at elevated temperature K. According to the generation of donor-like [8], we observed identical power-law time dependencies with an exponent for both N-and P-MOS independently of the vertical field polarity. The NBTI result exhibits the same in NMOS and PMOS, and reaches roughly eV cm .…”
Section: Interface Traps Generation Versus Oxide Charge Under N-ansupporting
confidence: 54%
“…And t d is also effected by the aging degradation. Several aging mechanisms can greatly affect reliability during the lifetime of an IC, including negative bias temperature instability (NBTI) [38,39] and hot carrier injection (HCI) [40]. Both NBTI and HCI increase the threshold voltage (V th ) and the t d .…”
Section: ) Tp T Ro Impacted By Ic Process Variationmentioning
confidence: 99%
“…These mechanisms include bias temperature instability (BTI), hot carrier injection (HCI), and oxide breakdown. Among the BTIs, as interface traps are more often to happen in PMOS transistors, negative bias temperature instability (NBTI) affecting PMOS is a more dominating aging effect compared to positive bias temperature instability (PBTI) affecting NMOS [1]. Both NBTI and PBTI increase the threshold voltage and degrade the speed of CMOS transistors.…”
Section: Introductionmentioning
confidence: 99%