Automated Contacting of On-Wafer Devices for RF Testing

Mubarak, Faisal; Martino, Carmine De; Toskovic, R.; Rietveld, G.; Spirito, M.

doi:10.1109/cpem49742.2020.9191800

Cited by 5 publications

(1 citation statement)

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“…In the effort to improve the contact repeatability, national metrology laboratories (NMIs) are well recognized to guaranty traceability of S-Parameters measurements [5]. Ongoing works are clearly oriented towards improving the probe to contact repeatability in the millimetre-wave (30 -300 GHz) up to the THz regime [11]- [12]. As mentioned in the introduction, we focus on the microwave regime (up to 67 GHz) with ultimate objective to address accurate measurements on extreme impedance devices.…”

Section: B Residual Calibration Error Termsmentioning

confidence: 99%

Impact of GSG Probe to Pads Contact Repeatability for On-Wafer RF Measurements

Mokhtari

Sebbache

Avramovic

et al. 2021

2021 IEEE 7th International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA)

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Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz -67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling the probe in the XY axis showed better results in terms of repeatability, more than 10 times à 10 GHz and more than 5 times à 60 GHz. The residual error terms are propagated to determine the measurement uncertainty on the complex impedance of capacitances theoretically tested. Capacitance value of 1 fF measured at 10 GHz was measured with an error around 80 %. Moving the probe on the Z-direction only demonstrated that, if the X and Y movements of the probe are theoretically controlled, the error could be reduced to ~7%. In addition, preliminary design and fabrication of a new compact on-wafer probe station built up with nanorobotics is proposed. Both chuck and RF probes are equipped with nano-positioning stages operating in close loop operation.

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Section: B Residual Calibration Error Termsmentioning

confidence: 99%