Abstract:Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz -67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling … Show more
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